A Critical Review of The Process and Challenges of Silicon Crystal Growth for Photovoltaic Applications

Sugunraj Sekar,Keerthivasan Thamotharan,Srinivasan Manickam,Bharathwaj Murugesan,Koichi Kakimoto,Ramasamy Perumalsamy
DOI: https://doi.org/10.1002/crat.202300131
2023-11-30
Crystal Research and Technology
Abstract:Solar panels made of crystalline silicon (c‐Si) have long been acknowledged as the sole economically viable and environmentally responsible alternative to fossil fuels. The present overview demonstrates how the components are the developed silicon ingot's distribution and impurity production are impacted by the furnace system, how the chemical reaction is impacted by the growing process. It also discusses the results of simulations and tests on the growth of c‐Si and mc‐Si ingots, as well as proposes the geometrical system, processing settings, and argon gas flow rate that are the most suitable. Crystalline silicon (c‐Si) solar cells have been accepted as the only environmentally and economically acceptable alternative source to fossil fuels. The majority of commercially available solar cells of all Photovoltaic (PV) cells produced worldwide, are made of crystalline silicon. Due to their excellent price/performance ratio and their demonstrated ecological durability, crystalline silicon wafers are by far the most common absorber material used in the production of solar cells and modules today. These wafers are primarily made using either a directional solidification that produces large‐grained multi‐crystalline (mc‐Si) wafers with a greater defect density or a solar‐optimized Czochralski (Cz) growing method that produces crystalline silicon with low defect density (c‐Si). The grown crystalline wafer contains foreign atoms that enhance the wire saw damage, reduce the minority carrier lifetime as a result get the minimum conversion efficiency of the solar cells. The current review illustrates how the elements of the furnace system affect impurity production and distribution of the developed silicon ingot and how the growth process affects the chemical reaction. Additionally, it covers the outcomes of simulations and experiments conducted on the growing process of c‐Si and mc‐Si ingots and recommends the most appropriate processing parameters, geometrical system, and argon gas flow rate.
crystallography
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