Abstract:As the most basic interconnection metallic material, copper (Cu) has been widely used in giant-large scale integrated circuits (GLSI). Corrosion inhibitors always play a crucial role in the Cu chemical mechanical polishing (CMP) process. The passivation of hydrogen peroxide (H2O2) alone is too weak to adequately protect against chemical corrosion on the surface of Cu film, thus, it is necessary to add corrosion inhibitors to the slurry. As a representative corrosion inhibitor, 1, 2, 4-triazole was compared with a novel corrosion inhibitor known as TT-LYK (ethanol, 2, 2′-[[(methyl-1H-benzotriazol-1-yl) methyl] imino] bis-), and their mixed inhibitor was studied in this paper. Different analytical methods such as the potentiodynamic polarization test, physical appearance phenomenon analysis, contact angle measurement and dynamic polishing experiment were used to compare their inhibition properties, and the fitting of different adsorption isotherms and static erosion tests were used to clarify the adsorption types and passivation processes respectively. The results indicated that both TT-LYK and 1, 2, 4-triazole achieved the goal of inhibiting Cu surface corrosion, but the inhibition effect of TT-LYK was slightly weaker at the same mass fraction. The corrosion protection of the two inhibitors is mainly attributable to the presence of organic inhibitor molecules on the surface of Cu by chemisorption and physisorption simultaneously. The passivation processes of both can be divided into two steps. First, the direct growth of the Cu-inhibitor passivation film occurs, followed by the redeposition of the Cu-inhibitor complex. From the results of electrochemical experiments, it can be concluded that the structure of the thin passivation film growing on the Cu surface varies with the inhibitor, and the composition of the passivation film was investigated by XPS and Raman spectrum analysis. At the same time, the surface roughness after polishing was found to decrease with the increase in inhibition effect of the inhibitors. According to the inhibition characteristics of these two inhibitors, a mixed corrosion inhibitor (TT-LYK and 1, 2, 4-triazole) was proposed in this study. Under the synergistic inhibition action, better inhibition effect and surface quality for Cu CMP were obtained. This outcome may be ascribed to the variation in the structure and density of the passivation film.

Two common antihistamine drugs as high-efficiency corrosion inhibitors for copper in 0.5M H2SO4

Phenothiazine drugs as novel and eco-friendly corrosion inhibitors for copper in sulfuric acid solution

A new pyridazine derivative synthesized as an efficient corrosion inhibitor for copper in sulfuric acid medium: Experimental and theoretical calculation studies

Synergistic inhibition of azoles compounds on chloride-induced atmospheric corrosion of copper: Experimental and theoretical characterization

Insight into the anti-corrosion mechanism of 2-aminobenzenethiol as the inhibitor for copper in acid environment

Insight into the anti-corrosion performance of two food flavors as eco-friendly and ultra-high performance inhibitors for copper in sulfuric acid medium

Exploring sustainable corrosion inhibition of copper in saline environment: An examination of hydroquinazolinones via experimental and ab initio DFT simulations

Insight into the Corrosion Inhibition of Copper in Sulfuric Acid Via Two Environmentally Friendly Food Spices: Combining Experimental and Theoretical Methods

Corrosion inhibition effect of benzimidazole and two derivatives on copper in alkaline environments: experimental and theoretical analyses

Adsorption behavior and corrosion inhibition performance of tetrazolium derivatives on electrolytic copper foil surface

Experimental and theoretical study of 2-mercaptopyridine as an effective eco-friendly inhibitor for copper in aqueous NaCl

Insights into the Inhibition Mechanism of Three 5-Phenyltetrazole Derivatives for Copper Corrosion in Sulfuric Acid Medium Via Experimental and DFT Methods

Study on the film forming mechanism, corrosion inhibition effect and synergistic action of two different inhibitors on copper surface chemical mechanical polishing for GLSI

3,4-Dimethoxy phenyl thiosemicarbazone as an effective corrosion inhibitor of copper under acidic solution: comprehensive experimental, characterization and theoretical investigations

Condensed Fukui function and experimental evaluation of the corrosion inhibition properties of some antipyrinyl‐imidazotriazole and their derivatives for copper in an acidic environment

Study on corrosion inhibition performance of 1-dodecyl-3-methyl-1 h-imidazolium nitrate on Cu in the sulfuric acid environment

Enhancing the corrosion inhibition of copper sheets in oil-in-water (O/W) emulsions by combining two organic heterocyclic derivatives

Experimental and Computational Investigation of Salicylhydroxamic Acid as a Corrosion Inhibitor for Copper in Alkaline Solutions

Pyracantha fortuneana alcohol extracts as biodegradable corrosion inhibitors for copper in H2SO4 media

3,5‐Bis(2‐thienyl)‐4‐amino‐1,2,4‐triazole As a Corrosion Inhibitor for Copper in Acidic Media

‘Pungent’ Copper Surface Resists Acid Corrosion in Strong HCl Solutions