High-precision two-dimensional displacement metrology based on matrix metasurface

Haofeng Zang,Zhiyu Zhang,Zuotang Huang,Yonghua Lu,Pei Wang

DOI: https://doi.org/10.1126/sciadv.adk2265

IF: 13.6

2024-01-11

Science Advances

Abstract:A long-range, high-precision, and compact transverse displacement metrology is of crucial importance in both industries and scientific researches. However, it is a great challenge to measure arbitrary two-dimensional (2D) displacement with angstrom-level precision and hundred-micrometer range. Here, we demonstrated a prototype of high-precision 2D-displacement metrology with matrix metasurface. Light passing through the metasurface is diffracted into three beams in horizontal (H), vertical (V), and diagonal (D) linear polarization. 2D transverse displacement of the metasurface relative to the incident light beam is retrieved from the interferential optical powers arisen from coherent superposition between H-polarized and D-polarized beams or V-polarized and D-polarized beams. We experimentally demonstrate that arbitrary displacement in 2D plane can be determined with high precision down to 0.3 nm in a large range of 200 micrometers. Our work broadens the application scope of metasurface and paves the way for development of ultrasensitive optical 2D displacement metrology.

multidisciplinary sciences

What problem does this paper attempt to address?

This paper primarily addresses the issue of high-precision two-dimensional displacement measurement. Specifically, the research team proposed a novel two-dimensional displacement measurement technology based on a matrix metasurface, which can achieve sub-nanometer precision measurements and has a large measurement range (up to several hundred micrometers). Below is a summary of the core issues addressed in the paper:

### Core Issues

1. **Challenges of Existing Technologies**:
- Current optical displacement measurement technologies struggle to simultaneously meet the requirements of large range, high precision, and compact design.
- The precision requirements for displacement measurement in semiconductor manufacturing are becoming increasingly stringent, reaching nanometer or even sub-nanometer levels.
- Existing technologies such as grating interferometers, although capable of multi-degree-of-freedom measurements, suffer from large structures and high system complexity.

2. **Proposed New Method**:
- By designing a special matrix metasurface combined with a 4f optical system, a direct correlation between displacement information and output optical power is achieved.
- This metasurface diffracts the incident light into three different polarization states (horizontal polarization H, vertical polarization V, and diagonal polarization D) and decodes the two-dimensional displacement information through changes in the interference optical power.
- High-precision measurement of arbitrary two-dimensional plane displacements within a range of 200 micrometers is achieved (with a minimum precision of 0.3 nanometers).

3. **Key Technical Points**:
- The design of the metasurface uses an array of elliptical nanopillars, which can simultaneously manipulate the phase, amplitude, and polarization state of light.
- By changing the polarization state of the incident light (from right-handed circular polarization to left-handed circular polarization), the "dead zone" problem in traditional methods is overcome, greatly expanding the measurement range.
- Experimental results validate the effectiveness and accuracy of this method, demonstrating its significant application potential in fields such as semiconductor manufacturing and ultra-high-resolution microscopy.

In summary, this paper aims to develop a new two-dimensional displacement measurement technology to address the limitations of current technologies in high-precision and large-range measurements, providing strong support for scientific research and technological development in related fields.