Image sensors using thin-film absorbers
Paweł E Malinowski,Vladimir Pejović,Itai Lieberman,Joo Hyoung Kim,Abu Bakar Siddik,Epimitheas Georgitzikis,Myung Jin Lim,Luis Moreno Hagelsieb,Yannick Hermans,Isabel Pintor Monroy,Wenya Song,Shreya Basak,Robert Gehlhaar,Florian De Roose,Aris Siskos,Nikolas Papadopoulos,Steven Thijs,Tom Vershooten,Naresh Chandrasekaran,Yunlong Li,Philippe Soussan,Jan Genoe,Paul Heremans,Jiwon Lee,David Cheyns
DOI: https://doi.org/10.1364/AO.485552
2023-06-10
Abstract:Image sensors are must-have components of most consumer electronics devices. They enable portable camera systems, which find their way into billions of devices annually. Such high volumes are possible thanks to the complementary metal-oxide semiconductor (CMOS) platform, leveraging wafer-scale manufacturing. Silicon photodiodes, at the core of CMOS image sensors, are perfectly suited to replicate human vision. Thin-film absorbers are an alternative family of photoactive materials, distinguished by the layer thickness comparable with or smaller than the wavelength of interest. They allow design of imagers with functionalities beyond Si-based sensors, such as transparency or detectivity at wavelengths above Si cutoff (e.g., short-wave infrared). Thin-film image sensors are an emerging device category. While intensive research is ongoing to achieve sufficient performance of thin-film photodetectors, to our best knowledge, there have been few complete studies on their integration into advanced systems. In this paper, we will describe several types of image sensors being developed at imec, based on organic, quantum dot, and perovskite photodiode and show their figures of merit. We also discuss the methodology for selecting the most appropriate sensor architecture (integration with thin-film transistor or CMOS). Application examples based on imec proof-of-concept sensors are demonstrated to showcase emerging use cases.