Numerical Simulation Research on Rotating Band Dynamic Engraving Process of CTA Artillery

J F Shi,L F Qian,H B Chen,Y C Zhu
DOI: https://doi.org/10.1088/1742-6596/2460/1/012045
2023-04-01
Journal of Physics: Conference Series
Abstract:Abstract In order to study the mechanical mechanism of the dynamic engraving process of the CTA band, the simulation model of the engraving process is established considering the friction and contact characteristics between the interfaces. The adaptive FEM-SPH coupling algorithm is used to obtain the variation law of the temperature and stress distribution of the band, the attitude of the projectile, and the dynamic engraving resistance through numerical calculation. The results show that the band undergoes plastic flow during engraving, and the surface temperature of the band is close to the melting point temperature of the material during the adiabatic engraving. The engraving process presents obvious segmented characteristics, and the initial engraving speed has an important influence on the spatial projectile attitude. The variation of dynamic engraving resistance is quite different from that of the quasi-static model, and the resistance has two ‘rising-decreasing’ processes.
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