Influence of Showerhead with Baffle on Physical Field of Hcvd Reactor

Qizhong Li,Yixuan Zhang,Baifeng Ji,Song Zhang,Rong Tu
DOI: https://doi.org/10.2139/ssrn.4261601
2022-01-01
SSRN Electronic Journal
Abstract:The physical field in halide chemical vapour deposition film growth is strongly affected by the structure of the reaction chamber. Notably, a highly uniform film thickness can be achieved by optimising this chamber. Therefore, after modelling a reactor, computational fluid dynamics was used in this study to measure temperatures and verify the accuracy of simulations. Based on changes in the substrate surface concentration and temperature, the feasibility of optimising the size and position of the baffle and the inclination angle of the spray holes was studied. The results revealed that on increasing the diameter of the baffle gradually, the uniformity of the substrate surface initially increased and then decreased. The most critical influence of the baffle position is the amount of gas on the substrate surface. As the inclination angle of the spray holes increased, the concentration at the centre of the substrate surface decreased, whereas that at the edge of the substrate increased. Meanwhile, the temperature field remained uniform after optimization. This study demonstrates that the showerhead and baffle can improve the physical field and that it is feasible to optimise the structure by analysing the physical field.
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