Nanometer-scale photon confinement in topology-optimized dielectric cavities

Marcus Albrechtsen,Babak Vosoughi Lahijani,Rasmus Ellebæk Christiansen,Vy Thi Hoang Nguyen,Laura Nevenka Casses,Søren Engelberth Hansen,Nicolas Stenger,Ole Sigmund,Henri Jansen,Jesper Mørk,Søren Stobbe

DOI: https://doi.org/10.1038/s41467-022-33874-w

IF: 16.6

2022-10-21

Nature Communications

Abstract:Abstract Nanotechnology enables in principle a precise mapping from design to device but relied so far on human intuition and simple optimizations. In nanophotonics, a central question is how to make devices in which the light-matter interaction strength is limited only by materials and nanofabrication. Here, we integrate measured fabrication constraints into topology optimization, aiming for the strongest possible light-matter interaction in a compact silicon membrane, demonstrating an unprecedented photonic nanocavity with a mode volume of V ~ 3 × 10 −4 λ 3 , quality factor Q ~ 1100, and footprint 4 λ 2 for telecom photons with a λ ~ 1550 nm wavelength. We fabricate the cavity, which confines photons inside 8 nm silicon bridges with ultra-high aspect ratios of 30 and use near-field optical measurements to perform the first experimental demonstration of photon confinement to a single hotspot well below the diffraction limit in dielectrics. Our framework intertwines topology optimization with fabrication and thereby initiates a new paradigm of high-performance additive and subtractive manufacturing.

multidisciplinary sciences