Flexoelectric Control of Defect Formation in Ferroelectric Epitaxial Thin Films

Daesu Lee,Byung Chul Jeon,Aram Yoon,Yeong Jae Shin,Myang Hwan Lee,Tae Kwon Song,Sang Don Bu,Miyoung Kim,Jin‐Seok Chung,Jong‐Gul Yoon,Tae Won Noh,Jin-Seok Chung,Jong-Gul Yoon
DOI: https://doi.org/10.1002/adma.201400654
IF: 29.4
2014-05-22
Advanced Materials
Abstract:Flexoelectric control of defect formation and associated electronic function is demonstrated in ferroelectric BiFeO3 thin films. An intriguing, so far never demonstrated, effect of internal electric field (Eint ) on defect formation is explored by a means of flexoelectricity. Our study provides novel insight into defect engineering, as well as allows a pathway to design defect configuration and associated electronic function.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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