Abstract:The Journal of Chemical Physics, Volume 0, Issue ja, -Not available-. Fluorination of graphene sheets with Xenon difluoride leads to the formation of the widest band gap Gr derivative, namely Fluorographene. Accurate experimental observations distinguish a two stages mechanism in the fluorination procedure, the half-fluorination stage wherein one side of the Gr sheet is rapidly fluorinated and then the full-fluorination stage involving much slower fluorination of the opposite side of the sheet [Nature Comm. 5, 1 (2014)]. Here, we perform comprehensive density functional calculations to illustrate accurate microscopic insights into the much slower rate of the full-fluorination stage, compared with the half-fluorination one. The calculated minimum energy paths for the half- and full-fluorination processes demonstrate much enhanced fluorine adsorption after the half-fluorination stage, which sounds inconsistent with the experimental picture. This ambiguity is explained in terms of significant chemical activation of the graphene sheet after half-fluorination, which remarkably facilitates the formation of chemical contaminants in the system and thus substantially slows down the full-fluorination procedure. After considering the binding energy and durability of the relevant chemical species, including hydrogen, oxygen, and nitrogen molecules and xenon atom, it is argued that oxygen-fluorine ligands are the most likely chemical contaminants opposing the complete fluorination of a graphene sheet. Then, we propose an oxygen desorption mechanism to carefully explain much enhanced rate of the full-fluorination procedure at elevated temperatures. The potential photocatalytic application of the pristine and defected samples in water splitting and carbon dioxide reduction reactions are also discussed.

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