Plasma-enabled multifunctional platform for gram-scale production of graphene and derivatives
Ana Dias,Edgar Felizardo,Neli Bundaleska,Miroslav Abrashev,Jivko Kissovski,Ana M. Ferraria,Ana M. Rego,Thomas Strunskus,Patrícia A. Carvalho,Amélia Almeida,Janez Zavašnik,Eva Kovacevic,Johannes Berndt,Nenad Bundaleski,Mohammed-Ramzi Ammar,Orlando M.N.D. Teodoro,Luís L. Alves,Bruno Gonçalves,Elena Tatarova
DOI: https://doi.org/10.1016/j.apmt.2024.102056
IF: 8.663
2024-01-21
Applied Materials Today
Abstract:Taking advantage of the high-energy-density microwave plasma environment as a unique 3D space for the self-assembly of free-standing nanostructures, a novel multifunctional platform for the continuous production of graphene and derivatives at the gram scale was developed. The platform is supported by a prototype plasma machine capable of performing a wide variety of industrially applicable processes within a single assembly environment. Free-standing graphene and nitrogen doped graphene, i.e., N-graphene nanosheets, and hybrid nanocomposites are assembled in a one-step process in seconds under atmospheric pressure conditions without the need of post-treatment. A single custom-designed machine enables the synthesis of an extensive array of hybrid nanomaterials featuring metal nanoparticles anchored in graphene. The method enables the conversion of a wide range of low-cost feedstock (e.g., ethanol, acetonitrile, etc.) into graphene and derivatives at a rate up to 30 mg/min. The resulting N-graphene sheets exhibit high quality, as evidenced by the highest reported presence of single atomic layers (45%), high ratio of 2D/G peak intensities in Raman spectra and N/O atomic ratio greater than one. The use of the obtained N-graphene in low secondary electron emission applications and in inkjet printing are explored. The presented plasma machine embodies significant potential to increase the effectiveness of plasma-driven process regarding productivity, costs and turnaround time.
materials science, multidisciplinary