Molecular dynamics simulation of gold cluster growth during sputter deposition

J. W. Abraham,T. Strunskus,F. Faupel,M. Bonitz
DOI: https://doi.org/10.1063/1.4948375
IF: 2.877
2016-05-14
Journal of Applied Physics
Abstract:We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis.
physics, applied
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