Synthesis of Amino Acid-derived Curing Reagents Containing a Disulfide Bond and Their Application to Anionic UV Curing Materials

Masahiro Furutani,Kako Maeno,Arata Tanaka
DOI: https://doi.org/10.2494/photopolymer.34.529
2021-06-11
Journal of Photopolymer Science and Technology
Abstract:Anionic UV curing has been applied for many kinds of industrial resins, because it overcomes technical problems in conventional radical and cationic UV curing. In this study, a cystine-based latent curing reagent was designed, and synthesized from <span>l</span>- and <span>d</span>-cysteine. The reagents showed not only good solubility toward organic media, but also good thermal decomposition behavior in the presence of basic species. Using them with a photo-base generator and an epoxy resin having a disulfide bond, UV-cured films of B-to-3B grade of pencil-hardness were fabricated successfully, after 10 J/cm2 of 365 nm-light irradiation and subsequent heating at 120-160°C for 30 min. Furthermore, two glass substrates were adhered by using this anionic UV curing system, and 1.6-3.7 MPa of shear stress was recorded in the photo-adhesion and re-adhesion experiments.
polymer science
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