An XPS study of polyimide film formation from the vapour deposition polymerisation of pyromellitic diimide (PMDI) and 4,4′-oxydianaline (ODA)

N. Than-Trong,P.Y. Timbrell,R.N. Lamb
DOI: https://doi.org/10.1016/0009-2614(93)89233-8
IF: 2.719
1993-04-01
Chemical Physics Letters
Abstract:Thin (≈40 Å) thermally stable polyimide films have been formed via the vapour phase co-deposition of pyromellitic diimide (PMDI) and 4,4′-oxydianaline (ODA) and subsequent heating up to 400°C on polycrystalline silver substrates. The film chemistry and composition were studied with X-ray photoelectron spectroscopy (XPS). PMDI has been used as an alternative to PMDA (pyromellitic dianhydride) and provides a new pathway to form polyimide films using the vapour deposition polymerisation (VDP) method. Ultra-thin (<10 Å) films of PMDI have also been examined and the XPS results indicate that PMDI bonds to the silver substrate via the imide nitrogen.
chemistry, physical,physics, atomic, molecular & chemical
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