Abstract:Bragg gratings are one of most powerful basic components for optical signal processing. They have been intensively used to construct various functional devices, such as lasers, modulators, WDM filters, optical delay lines, dispersion compensators, sensors etc. The Bragg grating can be regarded as one-dimensional photonic crystal whose performance can be easily tailored by changing the grating parameters. In this paper, we review our recent progress on Bragg gratings made on two different types of waveguide systems. The first one is based on ultra-thin silicon waveguides. Regular 220-nm-height silicon waveguides, due to the high optical confinement, are very sensitive to small variation in grating corrugations, and therefore well-controlled grating spectrum is difficult to obtain using DUV photolithography. We propose to use silicon waveguides with reduced height of around 60nm to make the Bragg gratings. Due to the weaker optical confinement, the waveguide propagation loss is lower and grating patterns are easier to be fabricated in the waveguide. Measurement on a spiral Bragg grating reveals that the stopband is around 1nm wide with extinction ratio larger than 40 dB. A transparency peak can occur in the stopband owing to the phase jump at the central S-junction of the spiral waveguide. Another type of Bragg gratings is based on a nanofiber coupled metal strip array. The nano-fiber is freely movable on top of the metal surface, allowing for the flexible reconfiguration of the grating system. Upon excitation of the hybrid plasmonic mode, a strong reflection peak occurs within a very short grating length. The reflection bandwidth is around 15nm with extinction ratio larger than 30 dB, applicable in CWDM filters.

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