Three-dimensional micropatterning of graphene by femtosecond laser direct writing technology

Yu-Qing Liu,Jiang-Wei Mao,Zhao-Di Chen,Dong-Dong Han,Zhi-Zhen Jiao,Jia-Nan Ma,Hao-Bo Jiang,Han yang
DOI: https://doi.org/10.1364/ol.45.000113
IF: 3.6
2019-12-19
Optics Letters
Abstract:The reduction and patterning of graphene oxides (GOs) have broad applications in gene transfection, cell differentiation control, etc. However, two-dimensional (2D) photoreduction technologies (such as UV lithography) fail to realize the three-dimensional (3D) reduction and patterning of GO, limiting its applications in 3D electronic device interconnection and 3D graphene organ-on-a-chip. Here we developed 3D reduction and patterning of GO by femtosecond laser direct writing (FsLDW) technology. FsLDW has been adopted for 3D structure fabrication and 2D/3D micropatterning of reduced GOs on GO films. We deem that this technology will advance GO in the evolution of future electronics.
optics
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