Abstract:Graphene(G),a single atomiclayer ofaromatic carbon atoms,has attracted much attention recently owing to its fascinating properties such as massless fermions, ballistic electronic transport, and ultrahigh electron mobility. [1] Currently, there are many approaches to the synthesis of graphene ranging from chemical vapor deposition from hydrocarbon to solution phase methods involving the chemical exfoliation of graphite. [2] One commonly used solution-processing route to graphene involved the chemical reduction of graphene oxide (GO). GO is produced by the oxidative treatment of graphite. [2] The basal planes of GO are decorated with epoxide and hydroxyl groups, while carboxylic and carbonyl groups are located at the edges. These oxygen functionalities render GO hydrophilic and improve its solubility, however they destroy the aromaticity of the graphene framework. As a result, GO is insulating, and a chemical reduction and thermal annealing treatment is needed before electronic conductivity could be recovered. The presence of oxygen functional groups also reduces the thermal stability of GO relative to that of G, since GO can be thermally pyrolized at high temperatures and transformed into volatile carbonaceous oxides. The thermal instability of GO motivates us to consider a strategy for the microstructuing of GO nanosheets using laser-assisted etching. The microstructuring of GO is relevant to the challenges of lithographically patterning G, since GO and G are interconvertible to some extent. Recently, promising approaches for the patterned assemblies of G on substrates have been developed. [3–8] Micro-contact printing using molecular templates was used to transfer GO sheets onto the pre-defined areas of the substrate surfaces via electrostatic attachment. [3] Large-scale G films were recently synthesized on patterned nickel layers using chemical vapor deposition. [7] All the patterning methods reported so far involved conventional lithographic techniques or employment of masks for the definition of patterns on substrates. To date, there are few demonstrations of a maskless, direct ‘‘writing’’ pattern on G-related materials using electron beam or optical methods.

Direct Imprinting of Microcircuits on Graphene Oxides Film by Femtosecond Laser Reduction

Direct Patterning on Reduced Graphene Oxide Nanosheets Using Femtosecond Laser Pulses

Laser Direct Writing of Graphene Nanostructures Beyond the Diffraction Limit by Graphene Oxidation

Femtosecond laser nanofabrication of field effect transistors from graphene oxides

Direct Writing of Graphene Patterns on Insulating Substrates under Ambient Conditions.

Insights into the surface responses of graphene oxide irradiated by an infrared femtosecond laser

Ablation threshold, structural modification, and sensing of graphene oxide thin film induced by UV nanosecond laser

Laser Direct Writing of Graphene Patterns

Direct Writing of Electronic Devices on Graphene Oxide by Catalytic Scanning Probe Lithography

Improved Reduction Of Graphene Oxide Through Femtosecond Laser Pulse Trains

Laser Direct Writing Graphene Patterns on Sio2/Si Substrates

Three-dimensional micropatterning of graphene by femtosecond laser direct writing technology

Surface And Interface Engineering Of Graphene Oxide Films By Controllable Photoreduction

Femtosecond Laser Rapid Fabrication of Large-Area Rose-Like Micropatterns on Freestanding Flexible Graphene Films

Towards pristine graphene-metal interface and microstructures: Laser assisted direct patterning on Epitaxial graphene

Transparent Interconnections Formed by Rapid Single-Step Fabrication of Graphene Patterns

Laser-induced direct graphene patterning and simultaneous transferring method for graphene sensor platform.

Study on reduction of graphene oxide films using picosecond laser direct writing

Microstructuring of Graphene Oxide Nanosheets Using Direct Laser Writing.

Fast Growth Of Graphene Patterns By Laser Direct Writing

Tunable Graphene Oxide Reduction and Graphene Patterning at Room Temperature on Arbitrary Substrates