High-mobility flexible/transparent p-type copper iodide thin-film transistors and complementary inverters
Haijuan Wu,Lingyan Liang,Xiaolong Wang,Xixiu Shi,Hengbo Zhang,Yu Pei,Wanfa Li,Bo Sun,Cai Shen,Hongtao Cao
DOI: https://doi.org/10.1016/j.apsusc.2022.155795
IF: 6.7
2023-03-01
Applied Surface Science
Abstract:High-performance transparent and low-process-temperature p-type devices are essential for portable and ‘invisible’ electronics. In this work, high-performance p-channel copper iodide (CuI) thin-film transistors (TFTs) with a bottom-gate structure are achieved via replacing traditional SiO2 dielectric with Chitosan (CS, a kind of solid polymer electrolytes), with the threshold voltage down to −0.35 V, field-effect mobility (μ FE) up to 60 cm2V−1s−1 and on/off current ratio (I on/I off) beyond 103. The CuI films spin-coated on CS-dielectrics in the air with high humidity have smoother surface morphology, tinier grains, higher packing density and hence a higher μ FE, in sharp contrast with the SiO2 case. In addition, the CuI films on CS-dielectrics demonstrate a work function ∼ 0.1 eV lower than that on SiO2, which implies a smaller hole concentration and higher I on/I off. And the low process temperature (<50 °C) facilitates the achievement of flexible and transparent CuI TFTs with μ FE and I on/I off comparable to those on rigid InSnO (ITO) glass. Furthermore, complementary inverters composed of p-type CuI and n-type ITO TFTs are demonstrated with clear inverting characteristics and voltage gain of over 20.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films