Surface characterization determined from the secondary electron emission coefficient upon ion bombardment

Faro Hechenberger,Felix Duensing,Lorenz Ballauf,Stefan Raggl,Benedikt Auer,Manuel Drost,Hannah Thiel,Daniel Fridrich,Alexander Menzel,Paul Scheier
DOI: https://doi.org/10.1016/j.apsusc.2020.148042
IF: 6.7
2021-02-01
Applied Surface Science
Abstract:The ion induced electron emission yield upon Ar+ ion impact at 420 eV was measured for a stainless-steel sample that was partially covered with a 50 nm thick gold layer. The ion induced electron emission yield for the two target materials differs strongly and enables to reproduce the shape of the gold film with a spatial resolution that corresponds to the width of the ion beam, which is 240 µm in the present case. Details in the two-dimensional map of the ion induced electron emission yield are explained by comparison with optical and scanning electron microscopy as well as with X-ray photoelectron spectroscopy measurements of the sample surface. In contrast to the sputtering efficiency, the ion induced electron emission yield does not depend on the orientation of the crystal structure.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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