Brain-inspired ferroelectric Si nanowire synaptic device

M. Lee,W. Park,H. Son,J. Seo,O. Kwon,S. Oh,M. G. Hahm,U. J. Kim,B. Cho
DOI: https://doi.org/10.1063/5.0035220
IF: 6.6351
2021-03-01
APL Materials
Abstract:We herein demonstrate a brain-inspired synaptic device using a poly(vinylidene fluoride) and trifluoroethylene (PVDF-TrFE)/silicon nanowire (Si NW) based ferroelectric field effect transistor (FeFET). The PVDF-TrFE/Si NW FeFET structure achieves reliable synaptic plasticity such as symmetrical potentiation and depression, thanks to the reversible dynamics of the PVDF-TrFE permanent dipole moment. The calculated asymmetric ratio of potentiation and depression is as low as 0.41 at the optimized bias condition, indicating a symmetrical synaptic plasticity behavior. Pattern recognition accuracy based on the actual synaptic plasticity data of the synaptic device can be estimated via the CrossSim simulation software. Our simulation result reveals a high pattern recognition accuracy of 85.1%, showing a potential feasibility for neuromorphic systems. Furthermore, the inverter-in-synapse transistor consisting of the Si NW FeFET synapse and resistor connected in series is able to provide energy-efficient logic circuits. A total noise margin [(NM<sub>H</sub> + NM<sub>L</sub>)/V<sub>DD</sub>] of 41.6% is achieved, and the power consumption [P<sub>s</sub> = V<sub>DD</sub>(I<sub>D,L</sub> + I<sub>D,H</sub>)/2] of the logic-in-synapse transistor is evaluated to be 0.6 <i>µ</i>W per logic gate. This study would shed light on the way toward a brain-inspired neuromorphic computing system based on the FeFET synapse device.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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