Dehydrofluorination as a Residue-Free Selective Route to C–C Bond Formation at Metal Surfaces

Jonathan Viereck,Yang Zhang,Elena Galoppini,Robert A. Bartynski,Sylvie Rangan
DOI: https://doi.org/10.1021/acs.jpcc.2c00712
2022-03-31
The Journal of Physical Chemistry C
Abstract:Directing covalent on-surface polymerization of molecular precursors through rational synthetic design has been impaired by the lack of control over reaction sites and by limited chemical routes to covalent bond formation between precursors, resulting in limited control of the outcomes and parasitic surface reaction byproducts. Here we investigate the mechanism of a recently reported chemical route to C–C bond formation: dehydrofluorination on metal surfaces. We demonstrate that this chemical route, involving specifically C–H/F–C pairs, favors the elimination of HF in the gas phase as a single step, therefore eliminating reaction byproducts at the surface of metals. Unlike dehalogenation, we find that the remarkable selectivity of the dehydrofluorination reaction renders this C–C bond formation strategy chemoselective as well as potentially regioselective, if employed with a properly designed molecular precursor. Additionally, we demonstrate that the catalytic role of the metal substrate can be used to steer reaction pathways and select between dehydrofluorination and dehydrogenation reaction. For these reasons, the dehydrofluorination reaction, largely unexplored on metal surfaces, could become a valuable tool for on-surface synthesis.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acs.jpcc.2c00712.TPD spectra as a function of molecular coverage and associated fits; XPS core level spectra and methodology for coverage calibration; STM analysis; anneal of a ZnTPP-m-oF8 multilayer (PDF)This article has not yet been cited by other publications.
What problem does this paper attempt to address?