Abstract:Plasma-enhanced chemical vapor deposition (PECVD) is a versatile technique for growing well-aligned, precisely patterned, multiwalled carbon nanotubes directly on substrates. We report on the characterization of PECVD deposited nanotubes using Auger Electron Spectroscopy (AES); we believe that this is the first comprehensive AES study of nanotubes and the effect of the deposition process on the substrate. The nanotubes contained well-crystallized graphitic carbon, in contrast to the amorphous/disordered carbon byproduct which is condensed on the substrate surface. By adjusting the deposition gas ratios, we show, using depth-profiled composition analysis, that it is possible to eliminate the unwanted amorphous carbon on the substrate surface. However, a 5 nm interfacial layer, which contained the plasma species, was always present on the substrate surface due to its exposure to the plasma. We could prevent the formation of this interfacial layer by shielding areas of the substrate from the plasma to achieve truly byproduct free deposition. This technique has allowed us to fabricate promising microelectronic field emission devices using vertically aligned carbon nanotubes.

Effects of micro- and macro-plasma-sheath electric fields on carbon nanotube growth in a cross-field radio-frequency discharge

Plasma Enhanced Chemical Vapour Deposited Carbon Nanotubes for Field Emission Applications

Study on the Definite Direction Growth of Carbon Nanotubes by the Microwave Plasma-Enhanced Chemical Vapro Phase Deposition

The Significance of Plasma Heating in Carbon Nanotube and Nanofiber Growth

Carbon Nanotubes As Field Emission Sources

Characterization of Plasma-Enhanced Chemical Vapor Deposition Carbon Nanotubes by Auger Electron Spectroscopy

Growth of Aligned Multiwall Carbon Nanotubes and the Effect of Adsorbates on the Field Emission Properties

Effects of gas pressure and plasma power on the growth of carbon nanostructures

Carbon Nanotubes And Their Potential Field Emission Applications

Study of Multi-Walled Carbon Nanotube Structures Fabricated by PMMA Suspended Dispersion

Growth Process Conditions of Vertically Aligned Carbon Nanotubes Using Plasma Enhanced Chemical Vapor Deposition

Synthesis and Characterization of Carbon Nanotube Grown on Flexible and Conducting Carbon Fiber Sheet for Field Emitter

Effect of surface morphology of Ni thin film on the growth of aligned carbon nanotubes by microwave plasma-enhanced chemical vapor deposition

Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Super-low Turn-on and Threshold Electric Fields of Plasma-Treated Partly Fe-filled Carbon Nanotube Films

Optical Plasma Control During ARC Carbon Nanotube Growth

Downstream Electric Field Effects during Film Deposition with a Radio Frequency Plasma and Observations of Carbon Reduction

Influence of plasma condition on carbon nanotube growth by rf-PECVD

Growth and Field Emission of Coiled Carbon Nanotubes by Plasma-Enhanced Chemical Vapor Deposition

Effect of Ion Bombardment on the Synthesis of Vertically Aligned Single-Walled Carbon Nanotubes by Plasma-Enhanced Chemical Vapor Deposition

A Magnetism-Assisted Chemical Vapor Deposition Method to Produce Branched or Iron-Encapsulated Carbon Nanotubes