Photoresponse and noise characteristics of in-situ fabricated NiPc nanowire photodetectors
Hao Wang,Xingyu Wang,Jihui Liao,Jian Song,Zihao Zhao,Lingyu Zhang,Wei Zhou,Yajun Li,Jinyou Xu
DOI: https://doi.org/10.1016/j.apsusc.2023.158017
IF: 6.7
2023-07-15
Applied Surface Science
Abstract:The interface between organic nanowires and metal layers plays a key role in determining the photoresponse and noise characteristics of organic nanowires. Herein, nickel phthalocyanine (NiPc) nanowires are self-aligned along parallel nanogrooves on a sapphire surface, and then photodetectors are fabricated in situ without post-growth transfer and alignment steps. This in-situ fabrication eliminates unpredictable factors associated with post-growth processing steps and allows us to focus on studying the influence of different nanowire-metal interfaces. Two different electrodes prepared by thermal evaporation deposition (TED) and etching-assisted transfer printing (ETP) are compared. While both electrodes ensure that NiPc nanowires exhibit a sensitive photoresponse in the 380–800 nm spectrum, the ETP electrodes result in higher sensitivity but an order of magnitude slower response due to the increased nanowire-metal interfacial capacitance. The noise power spectral density (PSD) confirms that for both photodetectors, the frequency-dependent 1/f noise dominates at frequencies below 10 kHz while the frequency-independent white noise increases significantly at higher frequencies. However, while the noise PSD of the photodetectors with TED electrodes remains stable with increasing temperature and bias, the noise PSD of the photodetectors with ETP electrodes increase by four to twelve orders of magnitude due to significantly increased electromigration and structural damage.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films