Scalable growth of atomically thin MoS 2 layers in a conventional MOCVD system using molybdenum dichloride dioxide as the molybdenum source

Xu Yang,Shisheng Li,Naoki Ikeda,Akihiro Ohtake,Yoshiki Sakuma
DOI: https://doi.org/10.2139/ssrn.4423021
IF: 6.7
2023-06-14
Applied Surface Science
Abstract:To bring atomically thin transition metal dichalcogenides (TMDs) to practical application, a highly reproducible process to grow them over a large scale is indispensable. Here, we develop a carbon-free reproducible route for the scalable growth of high-quality monolayer MoS 2 by selecting molybdenum dichloride dioxide (MoO 2 Cl 2 ) as the Mo source and integrating the precursor with a standard low-pressure cold-wall metalorganic chemical vapor deposition (MOCVD) system. Specifically, combined with H 2 S as the sulfur source and using catalytic Dragontrail glass (DT-glass) as the main substrate, we investigate the effect of MoO 2 Cl 2 flux, temperature, and deposition time on the growth, confirming MoO 2 Cl 2 with reasonably high vapor pressure is well compatible with the MOCVD system that enables precise control of sources for uniform nucleation and growth of MoS 2 over a large area. We successfully demonstrate the growth of carbon-free MoS 2 monolayers on DT-glass with decent crystalline, optical, and electrical properties. Additionally, the initial attempts also manifest that the proposed strategy could be generalized for growing ultrathin MoS 2 on other technologically important substrates, such as SiO 2 /Si and quartz, exhibiting superior optical quality and wafer-scale uniformity. This work provides a new avenue for the large-scale production of high-quality MoS 2 monolayers and facilitates their use in practical applications.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
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