Improvement of corrosion resistance and mechanism analysis for self-assembled vinyltriethoxysilane (VS) films on low carbon steel using a novel chemical etching method

Li-Xia Yang,Xue-Li Cao,Yun-Tao Wu,Shuo Chen,Xiao-Chun Xie,Qi-Liang Zhu,Jun-Xia Wang,Jun-E Qu,Sen Chen,Peng-Hua Zheng
DOI: https://doi.org/10.1016/j.corsci.2020.109002
IF: 7.72
2020-12-01
Corrosion Science
Abstract:<p>Vinyltriethoxysilane (VS) films with improved corrosion resistance and uniform thickness (∼2.8 μm) were fabricated on low carbon steel using a novel chemical etching method. The film forming mechanism occurred on the etched metal was investigated by experimental and theoretical methods. Results reveal that the metal hydroxylation and micro-rough surface generated in H<sub>2</sub>O<sub>2</sub>-containing etchant contribute to the enhancement of interfacial adhesion and protective performance for self-assembled films. However, there is an optimal etching time about 4 min forming denser interfacial layer with high adhesion of grade 1. Prolonged etching will cause inversely deterioration of the formed VS films.</p>
materials science, multidisciplinary,metallurgy & metallurgical engineering
What problem does this paper attempt to address?
The paper aims to address the following issues: 1. **Improving Corrosion Resistance**: By using a novel chemical etching method to self-assemble a vinyltriethoxysilane (VS) film with better corrosion resistance on the surface of low-carbon steel. 2. **Mechanism Analysis**: To study the mechanism of film formation on the etched metal surface and explore how this new chemical etching method affects the interfacial adhesion and protective performance of the film. 3. **Optimizing Etching Time**: To determine the optimal etching time to form a dense and well-adhered interfacial layer. Excessive etching time can lead to the deterioration of the film's performance. The paper discusses in detail the effects of metal surface hydroxylation and micro-roughness on the performance of self-assembled films through experimental and theoretical methods. It also evaluates the corrosion resistance of the films and changes in their surface morphology using electrochemical impedance spectroscopy (EIS) and atomic force microscopy (AFM).