Abstract:Template‐assisted crystallization method is developed to realize the wafer‐scale synthesis of homogeneous perovskite micro‐hemispheroid (PeMH) arrays for on‐chip light‐sources. Leveraging the plasmonic effect of enhanced electromagnetic fields and light‐matter interactions at subwavelength scales, PeMHs possess low thresholds surpassing the level of 10 μJ cm−2 and high Q‐factors exceeding 1500. All inorganic lead halide perovskites exhibit fascinating optical and optoelectronic characteristics for on‐chip lasing, but the lack of precise control of wafer‐scale fabrication for perovskite microstructure arrays restricts their potential applications in on‐chip‐integrated devices. In this work, a microstructure‐template assisted crystallization method is demonstrated via a designed chemical vapor deposition process, achieving the controllable fabrication of homogeneous perovskite micro‐hemispheroid (PeMH) arrays spanning the entire surface area of a 4‐inch wafer. Benefiting from the low‐loss whispering gallery resonance and plasmon‐enhanced light‐matter interactions in well‐confined hybrid cavities, this CsPbX3/Ag (X = Cl, Br) plasmonic microlasers exhibit quite low thresholds below 10 μJ cm−2. Interestingly, these thresholds can be efficiently modulated through the manipulation of plasmonic resonance and electromagnetic field mode in PeMHs owning various diameters. This strategy not only provides a valuable methodology for the large‐scale fabrication of perovskite microstructures but also endorses the potential of all‐inorganic perovskite nanostructures as promising candidates for on‐chip‐integrated light sources.

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Topologically Enabled Ultralarge Purcell Enhancement Robust to Photon Scattering

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Subwavelength-scale Lasing Perovskite with Ultrahigh Purcell Enhancement