Direct Optical Lithography of Colloidal Metal Oxide Nanomaterials for Diffractive Optical Elements with 2π Phase Control

Jia-Ahn Pan,Zichao Rong,Yuanyuan Wang,Himchan Cho,Igor Coropceanu,Haoqi Wu,Dmitri V. Talapin

DOI: https://doi.org/10.1021/jacs.0c12447

IF: 15

2021-01-28

Journal of the American Chemical Society

Abstract:Spatially patterned dielectric materials are ubiquitous in electronic, photonic, and optoelectronic devices. These patterns are typically made by subtractive or additive approaches utilizing vapor-phase reagents. On the other hand, recent advances in solution-phase synthesis of oxide nanomaterials have unlocked a materials library with greater compositional, microstructural, and interfacial tunability. However, methods to pattern and integrate these nanomaterials in real-world devices are less established. In this work, we directly optically pattern oxide nanoparticles (NPs) by mixing them with photosensitive diazo-2-naphthol-4-sulfonic acid and irradiating with widely available 405 nm light. We demonstrate the direct optical lithography of ZrO₂, TiO₂, HfO₂, and ITO NPs and investigate the chemical and physical changes responsible for this photoinduced decrease in solubility. Micron-thick layers of amorphous ZrO₂ NPs were patterned with micron resolution and shown to allow 2π phase control of visible light. We also show multilayer patterning and use it to fabricate features with different thicknesses and distinct structural colors. Upon annealing at 400 °C, the deposited ZrO₂ structures have excellent optical transparency across a wide wavelength range (0.3–10 μm), a high refractive index (<i>n</i> = 1.84 at 633 nm), and are optically smooth. We then fabricate diffractive optical elements, such as binary phase diffraction gratings, that show efficient diffractive behavior and good thermal stability. Different oxide NPs can also be mixed prior to patterning, providing a high level of material tunability. This work demonstrates a general patterning approach that harnesses the processability and diversity of colloidal oxide nanomaterials for use in photonic applications.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/jacs.0c12447?goto=supporting-info">https://pubs.acs.org/doi/10.1021/jacs.0c12447</a>.Experimental details, characterization techniques, relevant chemical structures, mechanism of DNS conversion to SICA, schematic of methods to obtain NPs in DMF, dynamic light scattering and zeta-potential measurements, plots of van der Waals interaction energies between spheres of different sizes, ³¹P NMR spectra of TOPO-capped HfO₂ and ZrO₂ NPs including the effects of the stripping procedures, additional FTIR spectra, ESI-MS data, results of p<i>K</i>_a calculation with the SPARC calculator, pattern evaluation with other photoacid generators, modeling the film transmittance with the transfer-matrix method, XRD spectra, spectroscopic ellipsometry fits with the Tauc–Lorentz model, control mechanism studies with preirradiated DNS and BDA (<a class="ext-link" href="/doi/suppl/10.1021/jacs.0c12447/suppl_file/ja0c12447_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.

chemistry, multidisciplinary

What problem does this paper attempt to address?

The key problem that this paper attempts to solve is to develop a direct optical lithography method for preparing diffractive optical elements (DOEs) with 2π phase - control ability. Specifically, the researchers aim to use solution - phase - synthesized metal oxide nanomaterials (NPs), mix them with photosensitive diazo - 2 - naphthalenesulfonic acid (DNS), and irradiate them with widely available 405 nm light to achieve the direct optical patterning of these nanomaterials. This method can not only achieve high - resolution patterning of micron - thick layers but also achieve 2π phase control in the visible light range. In addition, this method also shows the potential for multi - layer patterning and can be used to manufacture devices with different thicknesses and structural color characteristics. Through this technique, diffractive optical elements with efficient diffraction behavior and good thermal stability, such as binary - phase diffractive gratings, can be prepared.

### Main contributions
1. **Material selection and treatment**: Multiple metal oxide nanoparticles (such as ZrO₂, TiO₂, HfO₂ and ITO) were selected, and the direct optical patterning of these nanomaterials was achieved by mixing with the photosensitive compound DNS.
2. **Selection of photosensitive compound**: By comparing multiple photosensitive compounds, 1 - diazo - 2 - naphthalenesulfonic acid (1 - DNS) was finally selected as the best photosensitizer because it can be effectively decomposed into 3 - sulfo - 3H - indene - 1 - carboxylic acid (SICA) under illumination, significantly reducing the solubility of the film.
3. **Patterning mechanism**: The chemical and physical changes that lead to the decrease in the solubility of the nanoparticle film during the photo - conversion process from DNS to SICA were explored in detail. It was found that the strong binding force between SICA and the nanoparticle surface and the possible cross - linking effect are the main mechanisms.
4. **Performance verification**: The high transparency, high refractive index (n ≈ 1.84) and good optical smoothness of the prepared zirconia nanoparticle film in the visible and near - infrared regions were verified through experiments. In addition, the application of multi - layer patterning was also demonstrated, such as preparing a color parrot image with pixels of different heights.
5. **Practical application**: The potential of this method in preparing efficient diffractive optical elements (such as binary - phase diffractive gratings) was demonstrated. These elements exhibit high diffraction efficiency and good thermal stability in the visible light range.

### Conclusion
This research has successfully developed a direct optical lithography method that can efficiently prepare diffractive optical elements with 2π phase - control ability. By selecting appropriate photosensitive compounds and optimizing the patterning process, this method is not only applicable to multiple metal oxide nanoparticles but also can exhibit excellent optical performance and thermal stability in practical applications. This provides new possibilities for future applications in the field of photonics.