Abstract:In recent years, with the booming development of nanodevices and technologies, the nanoscale thermal cloak has gradually attracted researchers' interest due to its unique way of utilizing heat energy. However, most existing studies only restrictively place the nanoscale thermal cloak in a constant external environment but neglect the study of its performance under dynamic conditions, which results in insufficient understanding and limits the application scope of this functional structure. Therefore, in this paper, we design a nanoscale thermal cloak and explore functional response in a triangular waveform-based dynamic temperature, in which temperature peak and change period are set as variables. The results show that the nanoscale thermal cloak performs well in three different dynamic environments and that the larger the amorphous ring width, the smaller the temperature peak, and the larger the variation period, the better the cloaking effect. Furthermore, we propose to use the response temperature to quantify the disturbance of the cloak's presence in the external environment. The smaller the amorphous ring width, the smaller the disturbance to the external temperature. When the ring width is fixed, the temperature peak is smaller, the variation period is longer, and the external temperature disturbance is smaller. Finally, we use phonon localization theory to explain the underlying mechanism. By calculating and analyzing the phonon density of states (PDOS) and mode participation rate (MPR), we find that phonon localization in the functional region is the main reason for the cloaking phenomenon. In addition, we plot the spatial distribution information of phonon localization to visualize the phenomenon of localization. This study expands the application scope of the nanoscale thermal cloak and can provide a reference for the development of other nanoscale devices.

Nanoscale Thermal Cloak Based on Amorphous Hole Structure of Silicon Film

Nanoscale Thermal Cloaking in Silicon Film: A Molecular Dynamic Study

Numerical Analysis on Nanoscale Thermal Cloak in Three-Dimensional Silicon Film with Circular Cavities

Thermal Cloaking in Nanoscale Porous Silicon Structure by Molecular Dynamics

Performance Investigation of Nanoscale Thermal Cloak by the Perforated Silicon Film

Mechanism analysis of double-layer nanoscale thermal cloak by silicon film

Nanoscale Thermal Cloaking by In-Situ Annealing Silicon Membrane

Thermal Cloak-Concentrator

Ion Write Microthermotics: Programing Thermal Metamaterials at the Microscale

Thermal Cloaking Phenomenon in the Convex Structure Silicon Film

Construction and mechanism analysis on nanoscale thermal cloak by in-situ annealing silicon carbide film

Performance analysis of thermal cloak with porous silicon structure

Performance Prediction of Nanoscale Thermal Cloak by Molecular Dynamics

Mechanism analysis and optimization of dynamic functional response of nanoscale thermal cloak

Study on Phonon Localization in Silicon Film by Molecular Dynamics

Inverse Thermal Design of Nanoporous Thin Films for Thermal Cloaking

Super-Suppression of Long Phonon Mean-Free-Paths in Nano-engineered Si due to Heat Current Anticorrelations

Probing Thermal Transport Across Amorphous Region Embedded in a Single Crystalline Silicon Nanowire

Effect of Amorphisation on the Thermal Properties of Nanostructured Membranes

Tuning Thermal Resistance of SiC Crystal/amorphous Layered Nanostructures Via Changing Layer Thickness

Nanoscale Thermal Cloaking in Graphene Via Chemical Functionalization.