Defect and Doping Engineering Mediated M-D-MIL(Fe)/Cu-C3N4 Heterojunction with Dual Active Centers for Efficient Tetracycline Hydrochloride Removal

Jiandong Guo,Aiqin Zhang,Zihao Wang,Yuanqing Li,Xuguang Liu,Husheng Jia
DOI: https://doi.org/10.1016/j.jallcom.2024.175653
IF: 6.2
2024-01-01
Journal of Alloys and Compounds
Abstract:It is essential to explore Fe-MOFs catalysts containing both multiple active sites and rapid charge separation for improving photo-Fenton performance. Herein, a defect and doping engineering mediated M-D-MIL(Fe)/Cu-C3N4 heterojunction with dual active centers was prepared and its removal performance was investigated against tetracycline hydrochloride. Characterization confirms that: (1) The ligand vacancies in M-D-MIL(Fe) can expose plenty of coordinatively unsaturated metal sites (Fe CUS), which enhance the Lewis acidity and optimize the adsorption of H2O2. Meanwhile, the built-in dual redox centers (Fe3+/Fe2+ and Cu+/Cu2+) can synergistically promote the activation of H2O2. (2) The ligand vacancies in M-D-MIL(Fe) and copper ion in C3N4 as electron trapping sites can optimize the carrier separation of single-component materials. Furthermore, the composites exhibit a suitable energy band structure, an oriented built-in electric field, and tight interfacial contacts, all of which collectively create an optimal pathway and driving force for the efficient transport of photoinduced charges. This, in turn, accelerates the Fe3+/Fe2+ redox cycle. Finally, M-D-MIL(Fe)/Cu-C3N4 demonstrates excellent photo-Fenton performance at low H2O2 concentrations (5 mM), with a kinetic rate (k) of 0.035 min-1, which is 14.58, 18.42, 1.94, and 15.21 times higher than those of MIL-100(Fe), C3N4, M-D-MIL(Fe), and Cu-C3N4, respectively. The study presents an innovative idea with potential applications in environmental restoration.
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