Z-scheme Cobalt-Iron Oxide/perylene Diimide Supermolecule Heterojunction for High-Efficiency Ciprofloxacin Removal in a Photocatalysis-Self-fenton System

Rong Ji,Yuming Dong,Hui Zhao,Chengsi Pan,Guangli Wang,Yongfa Zhu,Junshan Li
DOI: https://doi.org/10.1016/j.jcis.2023.05.180
IF: 9.9
2023-01-01
Journal of Colloid and Interface Science
Abstract:Fenton technology has been famous on antibiotics removal, but seriously restricted by the extra addition of H2O2 and low mineralization efficiency. Herein, we develop a novel cobalt-iron oxide/perylene diimide organic supermolecule (CoFeO/PDIsm) Z-scheme heterojunction under photocatalysis-self-Fenton system, in which the holes (h+) of photocatalyst can mineralize organic pollutants and the photo-generated electrons (e ? ) are used to in-situ H2O2 production with high efficiency. The CoFeO/PDIsm exhibits superior in-situ H2O2 production at a rate of 281.7 & mu;mol g+1 h-1 in contaminating solution, correspondingly of total organic carbon (TOC) removal rate of ciprofloxacin (CIP) is 63.7 %, far exceeding current photocatalysts. The high H2O2 production rate and remarkable mineralization ability are ascribed to great charge separation in Z-scheme heterojunction. This work provides a novel Z-scheme heterojunction with photocatalysis-self-Fenton system for environmental-friendly removing the organic containment.
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