BEOL Large-Scale Integration and Precise Programming of HfO$_{\textit{x}}$/AlO$_{\textit{y}}$ Superlattice-Like Multilevel Memristors

Menghua Huang,Pinfeng Jiang,Chengxu Wang,Meiqing Wang,Yinghao Ma,Zhouchao Gan,Yifan Yang,Xiangshui Miao,Xingsheng Wang
DOI: https://doi.org/10.1109/ted.2024.3406310
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:The memristor is a promising candidate for multilevel memory and neuromorphic computing. This study successfully integrated HfOx/AlOy superlattice-like (SLL) memristors in the 0.18/0.5 mu m CMOS back-end-of-line (BEOL) process and statistically analyzed their performance. We identified that BEOL annealing (400 degree celsius/30 min) can cause oxygen diffusion and short-circuiting, but reducing Ti electrode thickness mitigates this issue. Furthermore, low post-forming resistance is discussed and solved by one transistor one memristor (1T1M) structure. Finally, we fabricate a 1T1M crossbar array with a size of 1 Kb in the 0.18 mu m CMOS process. We demonstrated the multilevel characteristics and endurance of 1T1M. Furthermore, the stable and precise multilevel conductance programming of memristors is achieved by a specific writing method and we simulated the effect of conductance of failure bits on classification accuracy in a four-layer MLP network on the MNIST dataset.
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