Controlled NiOx Defect Engineering to Harnessing Redox Reactions in Perovskite Photovoltaic Cells Via Atomic Layer Deposition

Xuteng Yu,Chang Liu,Chi Li,Can Wang,Yuheng Li,Lusheng Liang,Wei Yu,Yao Wang,Chunming Liu,Yanrui Liu,Gaoyuan Yang,Wanqiang Fu,Qin Zhou,Shui-Yang Lien,Yunyu Wang,Peng Gao

DOI: https://doi.org/10.1021/acsami.4c03761

IF: 9.5

2024-01-01

ACS Applied Materials & Interfaces

Abstract:Albeit the undesirable attributes of NiOx, such as low conductivity, unmanageable defects, and redox reactions occurring at the perovskite/NiOx interface, which impede the progress in inverted perovskite solar cells (i-PSCs), it is the most favorable choice of technology for industrialization of PSCs. In this study, we propose a novel Ni vacancy defect modulate approach to leverage the conformal growth and surface self-limiting reaction characteristics of the atomic layer deposition (ALD)-fabricated NiOx by varying the O2 plasma injection time (tOE) to induce self-doping. Consequently, NiOx thin films with enhanced conductivity, an appropriate Ni3+/Ni2+ ratio, stable surface states, and ultrathinness are realized as hole-transporting layers (HTLs) in p-i-n PSCs. As a result of these improvements, ALD-NiOx-based devices exhibit the highest power conversion efficiency (PCE) of 19.86% and a fill factor (FF) of 81.86%. Notably, the optimal interfacial defects effectively suppressed the severe reaction between the perovskite and NiOx. This suppression is evidenced by the lowest decay rate observed in a harsh environment, lasting for 500 consecutive hours. The proposed approach introduces the possibility of a hierarchical distribution of defects and offers feasibility for the fabrication of large-area, uniform, and high-quality films.