Abstract:As a pillar material of semiconductors, single-crystal silicon (Si) has attracted much attention due to its excellent electronic properties. Meanwhile, femtosecond laser processing as a convenient fabrication method for miniaturized structures provides an effective way to improve the performance of Si-based devices. However, the final-state analysis of femtosecond laser-induced Si micro-nano structures remains to be explored. In this study, the evolution of the micro-nano structures and the variation of surface and subsurface damage with pulse number were studied. Based on the atomic structure, the amorphous layer, dislocation layer, and unaffected layer were found. The amorphous layer resulted from the re-solidification of melted materials. The dislocation layer consisted of dislocations and lattice distortion. The unaffected layer retained the initial lattice structure and was not affected by laser irradiation. The high temperature and stress induced by multiple pulses led to the stacking faults and nano-twins in the subsurface layer. The evolution of the Si structure was essentially a transition process from a dislocation layer to a high-density defect layer and a transition process from nanotips to laser-induced periodic surface structures. During this process, dislocations dominated the femtosecond laser-induced microstructural deformation, affecting the nano-hardness of the irradiated surface. As a result, the nano-hardness of Si structures fabricated using femtosecond laser processing was maximally enhanced by 9.54%. This work provides new information about ultrafast laser-induced surface and subsurface damage, which is significant for the efficient and high-precision fabrication of Si-based functional micro-nano devices.

Irradiation Characteristics of Nanosecond Laser on Silicon under Vacuum Conditions

Atomic-Level Modeling of A Silicon Nanofilm Irradiated by Ultrashort-Pulsed Laser Bursts

Combined Continuum-Atomistic Modeling of Ultrashort-Pulsed Laser Irradiation of Silicon

Thermal Damage of Monocrystalline Silicon Irradiated by Long Pulse Laser

Effect of high-power nanosecond and femtosecond laser pulses on silicon nanostructures

Experimental Study on 800 Nm Femtosecond Laser Ablation of Fused Silica in Air and Vacuum

Bulk Damage and Stress Behavior of Fused Silica Irradiated by Nanosecond Laser

Effects of Vacuum on Fused Silica UV Damage

One-Step femtosecond laser irradiation of Single-Crystal Silicon: Evolution of Micro-Nano structures and damage investigation

Nanomechanical Properties of Single-Crystalline Silicon Wafer Irradiated by High-Energy Femtosecond Laser Pulses

Study on Radiation Damage of Silicon Solar Cell Electrical Parameters by Nanosecond Pulse Laser

Investigation of mechanism and surface morphology on the femtosecond laser ablation of silicon nitride under different auxiliary processing environments

Laser-Induced Damage Threshold of Silicon under Combined Millisecond and Nanosecond Laser Irradiation

Effects of Parameters in Femtosecond Laser Micromachining on Ablation of Silicon

Hydrodynamic Simulation of Silicon Ablation by Ultrashort Laser Irradiation

Theory Analysis of Wavelength Dependence of Laser-Induced Phase Explosion of Silicon

Experimental study of the damage morphology induced by the millisecond–nanosecond combined-pulse laser with different pulse delay on silicon

Delayed Phase Explosion During High-Power Nanosecond Laser Ablation of Silicon

Effects of CO2 Laser Irradiation on Surface Morphology and Stress Distribution of Fused Silica

Optical Properties and Laser Damage Performance of Sio2 Irradiated by High-Power Pulsed Electron Beam

The Ripples and Nanoparticles on Silicon Irradiated by Femtosecond Laser