A SelectiveNet-Based Method for Defect Classification in Semiconductor Manufacturing

Qian Jin,Yibo Qiao,Yining Chen,Cheng Zhuo,Qi Sun
DOI: https://doi.org/10.1109/cstic61820.2024.10531871
2024-01-01
Abstract:In semiconductor manufacturing, accurately classifying defects in scanning electron microscope (SEM) images is crucial for optimizing the production process. This paper introduces a novel defect classification frame-work based on SelectiveNet, which can reject predictions for defects with a high risk of misclassification through selective learning, effectively balancing the trade-offs between prediction coverage and accuracy for highly diverse and complex real SEM images. The efficacy of our proposed approach is demonstrated in the experiments with 95.14% classification accuracy with no reject and 98.37% at a selective learning coverage of 91.17% (rejection of 8.83%).
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