Oxygen Plasma Activated Au-assisted Mechanical Exfoliation for Large-Area, High-Quality Metal Phosphorus Trichalcogenides Flakes

Mouhui Yan,Haotian Wang,Guanghui Cao,Wei Ren
DOI: https://doi.org/10.1016/j.cplett.2024.141634
IF: 2.719
2024-01-01
Chemical Physics Letters
Abstract:The Au-assisted exfoliation method represents an advanced technique among mechanical exfoliation methods. However, the extensive constraints associated with the exfoliation process curtail the broader adoption and application of this technique. Here, we introduce a mild oxygen plasma process to reactivated the Au substrate, thereby addressing environmental-induced metal substrate failures and enabling the exfoliation of ultrathin flakes from layered CoPS3 and MnPS3. The obtained flakes measure up to several hundred microns and demonstrate high quality, as revealed by AFM, XPS, and Raman. This modified approach effectively enhance the practicality of the type of exfoliation method employing a metal film as tape.
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