ERRATA: MICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATURE

Wu Zhi-Meng,Qingsong Lei,Jianping Xi,ZHAO YING,Xinhua Geng
DOI: https://doi.org/10.1142/s0217979205032310
2005-01-01
International Journal of Modern Physics B
Abstract:International Journal of Modern Physics BVol. 19, No. 21, pp. 3413 (2005) ErrataFree AccessERRATA: MICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATUREis erratum ofMICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATUREZHIMENG WU, QINGSONG LEI, JIANPING XI, ZHAO YING, and XINHUA GENGZHIMENG WUResearch Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, P. R. China, QINGSONG LEIResearch Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, P. R. China, JIANPING XIResearch Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200030, P. R. China, ZHAO YINGInstitute of Optoelectronics, Nankai University, Tianjin 300071, P. R. China, and XINHUA GENGInstitute of Optoelectronics, Nankai University, Tianjin 300071, P. R. Chinahttps://doi.org/10.1142/S0217979205032310Cited by:0 Previous AboutSectionsPDF/EPUB ToolsAdd to favoritesDownload CitationsTrack CitationsRecommend to Library ShareShare onFacebookTwitterLinked InRedditEmail [International Journal of Modern Physics B, Vol. 19, No. 18 (2005) 3013–3020] You currently do not have access to the full text article. Recommend the journal to your library today! FiguresReferencesRelatedDetailsRelated articlesMICROCRYSTALLINE SILICON FILMS PREPARED BY VERY HIGH FREQUENCY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION AT LOW TEMPERATURE25 Jan 2012International Journal of Modern Physics B Recommended Vol. 19, No. 21 Metrics History PDF download
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