Acid-Resistant Polyarylether Nanofiltration Membrane by Interfacial Polymerization of Cyanuric Chloride and Hydroquinone

Jing Wang,Yating Zeng,Shupeng Lin,Zhikan Yao,Zhijun Zhou,Liping Zhu,Lin Zhang

DOI: https://doi.org/10.2139/ssrn.4468249

2023-01-01

Abstract:The increasing demand for species separation in acidic system requires the development of novel membranes capable of resisting the degradation caused by nucleophilic protons. Conventional polyamide nanofiltration membranes have limitations in achieving the desired acid resistance. Herein, we present an acid-resistant nanofiltration membrane with triazine-based polyarylether framework, fabricated through interfacial polymerization between hydroquinone and cyanuric chloride, serving as the aqueous and organic monomer, respectively. This approach effectively addresses the issue of the stepwise decreased reactivity of cyanuric chloride that occurs when using conventional high-reactive aromatic amine monomers. Such decreased reactivity leads to the formation of a loose separation layer. The performance of the membrane can be tailored by screening the organic solvent and controlling the concentration of cyanuric chloride. Toluene is identified as the optimal solvent, providing an appropriate reaction rate and favorable film-forming property due to its moderate polarity and diffusivity of hydroquinone molecular. A low concentration of cyanuric chloride (0.5 w/v) is preferable for obtaining a polyarylether membrane with a high degree of crosslinking, ensuring the satisfactory separation property. The resulting polyarylether membrane exhibits exceptional rejection for sunset yellow to 97.2% with an excellent water permeability up to 13.08 L·m-2·h-1·bar-1. Moreover, the membrane demonstrates remarkable acid resistance, maintaining long-term stability for up to 28 days under a pH of 2.