Abstract:Spectroscopic ellipsometry is a powerful method with high surface sensitivity that can be used to monitor the growth of even sub-monolayer film. However, the analysis of ultrathin films is complicated by the correlation of the dielectric constant and the thickness. This problem is usually resolved by fixing one or the other value, limiting the information that can be extracted. Here, we propose a method to determine unambiguously the refractive index, extinction coefficient and thickness of a film when a transparent range is available in the energy range investigated. We decompose the analysis in three steps. First, the thickness of the film is determined from the transparent range of the film. Then, knowing the thickness of the layer, an initial estimation of the refractive index and extinction coefficient is made based on a first-order Taylor expansion of the ellipsometric ratio. Finally, using this estimation, a numerical regression is done to ensure the convergence of the fit towards the solution. A theoretical example of the method is given for two different thicknesses of TiO2 films. Finally, the method is applied to the experimental data measured during the atomic layer deposition of a thin film of Hf0.5Zr0.5O2 grown on Si. The thickness, refractive index and extinction coefficient are retrieved with a high precision in the energy range of 3.5 - 6.5 eV. A detailed analysis is presented on the accuracy of the retrieved values and their dependency on random and systematic errors for different energy ranges.

Dynamic Spectroscopic Imaging Ellipsometry for Thickness Measurement Based on a Dual-Comb System

Dynamic ellipsometry measurement based on a simplified phase-stable dual-comb system.

Scanning Interferometric Method for Measuring Group Delay of Dispersive Mirrors

Metasurface array for single-shot spectroscopic ellipsometry

Spectroscopic ellipsometry utilizing frequency division multiplexed lasers

An Interferometer for Measuring Thickness and Spacing

Simultaneous Thickness, Velocity, Density, and Attenuation Measurement of a Thin Layer by Time-Resolved Acoustic Microscopy

Simultaneous Measurement of Local Longitudinal and Transverse Wave Velocities, Attenuation, Density, and Thickness of Films by Using Point-Focus Ultrasonic Spectroscopy

Simultaneously Measuring Thickness, Density, Velocity and Attenuation of Thin Layers Using V(z,t) Data from Time-Resolved Acoustic Microscopy.

Simultaneous Measurement of Elastic Moduli, Attenuation, Density, and Thickness of a Layer by Ultrasonic Spectroscopy Using Point-Focus Transducer

Spectral Interference Ellipsometry for Film Thickness Measurement on Transparent Substrate

Large-Area Thickness Measurement of Transparent Films Based on a Multichannel Spectral Interference Sensor

A New Interferometer for Measuring Ultra-Small Thickness and Spacing

Dynamic Ellipsometry Measurement Based on a Simplified Independent Locking Dual-Comb System

Fast Measurement of the Thickness and Group Refractive Index Distribution of Solid Plates by Line-Field Dispersive Interferometry.

A Review of Thin-film Thickness Measurements using Optical Methods

High-Performance Ellipsometry with 2-D Expanded Channels for Spectroscopy and Polarization Analysis

A 2-Dimensionalal Thickness Measurement Ellipsometer Based on the the the Liquid Crystal Variable Retarder

A fully automatized method for the unambiguous wavelength-by-wavelength determination of the thickness and optical property of a very thin film with a transparent range

Optical interference system for simultaneously measuring refractive index and thickness of slim transparent plate