Abstract:Quantum dots (QDs) have been considered next-generation display fluorescent conversion materials due to their excellent color purity and photoluminescence quantum yield. In order to integrate QD with Micro/Mini-LED and other microdevices efficiently, it is necessary to fabricate micro-scale QD pixel arrays. Photolithography is an effective method for fine pattern processing, but conventional photolithographic procedures need to compound QD with a photosensitive curing matrix, which is not conducive to obtaining high color purity QD pixels. Therefore, a QD self-assembly strategy based on a hydrophobic-hydrophilic transformation substrate is proposed, combining ultraviolet (UV) mask exposure and surface charge modification technology to manufacture a high-purity QD pixel array. In this paper, the hydrophobic-hydrophilic transformation substrate is prepared by polyvinylidene fluoride (PVDF)/TiO 2 hybrid fibrous membrane substrate. By changing the thickness of the substrate and analyzing its threshold of the photocatalysis time and pattern accuracy combined with the transmittance after encapsulation, the optimal substrate thickness is about 30 um. On this basis, the surface charge of the fibrous membrane is further modified by poly(diallyldimethylammonium chloride) (PDDA) to enhance the self-assembly performance of the QD in the hydrophilic region. The dimensional accuracy and optical characteristic of the QD pixel array have been studied in detail. The color average degree is 96.4%, the consistency is 94.5%, and the dimensional accuracy error is 5.2%. The spectrum of the QD pixel is almost the same as the QD solution, and the transmittance of the films is up to 88.8% under the visible light wave band, which has excellent optical performance. Therefore, this strategy is beneficial for efficiently manufacturing the high-purity QD pixel array, which has a broad application prospect in the high-resolution display field of Micro/Mini light-emitting diodes (LEDs).

P‐11.3: Manufacturing Quantum Dot Pixel Array via Self‐Assembling on Hydrophobic‐Hydrophilic Transformation Substrate

Wafer-scale patterning of high-resolution quantum dot films with a thickness over 10 μm for improved color conversion.

Perovskite quantum dot microarrays: In situ fabrication via direct print photopolymerization

Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.

Direct Photopatterning of Colloidal Quantum Dots with Electronically Optimized Diazirine Cross-Linkers

Quantum Dot Film Patterning on a Trenched Glass Substrate for Defining Pixel Arrays of a Full-color Mini/Micro-LED Display

Large-area patterning of full-color quantum dot arrays beyond 1000 pixels per inch by selective electrophoretic deposition

14.4: Inkjet Printing Patterned Quantum Dot Microarrays

Full-Colour Quantum Dot Displays Fabricated by Transfer Printing

High‐Resolution Full‐Color Quantum Dots Patterning for Display Applications Based on Femtosecond Laser‐induced Forward Transfer

Monolithic Integration of Full‐Color Microdisplay Screen with Sub‐5 μm Quantum‐Dot Pixels

High-Resolution Colloidal Quantum Dot Film Photolithography via Atomic Layer Deposition of ZnO

Dewetting-assisted inkjet printing and optimized solvent mixture of Cd-free InP quantum dots for high-resolution pixel-pattern

Ultrahigh-resolution, high-fidelity quantum dot pixels patterned by dielectric electrophoretic deposition

High‐Resolution, Highly Transparent, And Efficient Quantum Dots Light‐Emitting Diodes

High-performance, high-resolution quantum dot light-emitting devices through photolithographic patterning

High Performance Pixelated Quantum Dots Array on Micro-Led by Inkjet Printing

Ultra‐High‐Resolution Perovskite Quantum Dot Light‐Emitting Diodes

Quantum Dots Photoresist for Direct Photolithography Patterning

High‐Resolution Inkjet Printing of Quantum Dot Light‐Emitting Microdiode Arrays

Inkjet‐printed multi‐color arrays based on eco‐friendly quantum dot light emitting diodes with tailored hole transport layer