Challenges and Recent Advances in HfO2-based Ferroelectric Films for Non-Volatile Memory Applications
Ming-Hao Shao,Rui-Ting Zhao,Houfang Liu,Wen-Jia Xu,Yi-Da Guo,Da-Peng Huang,Yu-Zhe Yang,Xin-Ru Li,Wancheng Shao,Peng-Hui Shen,Junwei Liu,Kuanmao Wang,Jinguo Zheng,Zhao-Yi Yan,Jian-Lan Yan,Tian Lu,Yi Yang,Tian-Ling Ren
DOI: https://doi.org/10.1016/j.chip.2024.100101
2024-01-01
Chip
Abstract:The emergence of data-centric applications such as artificial intelligence (AI), machine learning, and the Internet of Things (IoT), has promoted surges in demand for storage memories with high operating speed and nonvolatile characteristics. HfO2-based ferroelectric memory technologies, emerging as a promising alternative, have attracted considerable attention for their high performance, energy efficiency, and full compatibility with the standard complementary metal-oxide-semiconductors (CMOS) process. These nonvolatile storage elements, such as ferroelectric random access memory (FeRAM), ferroelectric field-effect transistors (FeFETs), and ferroelectric tunnel junctions (FTJs), possess different data access mechanisms, individual merits and specific application boundaries in next-generation memories or even beyond von-Neumann architecture. This paper provides an overview of ferroelectric HfO2 memory technologies, addresses the current challenges and offers insights into future research directions and prospects.