Plasma-etched Ti2O3with Oxygen Vacancies for Enhanced NH3electrosynthesis and Zn–N2batteries

Haijun Chen,Zhaoquan Xu,Shengjun Sun,Yongsong Luo,Qian Liu,Mohamed S. Hamdy,Zhe-sheng Feng,Xuping Sun,Yan Wang
DOI: https://doi.org/10.1039/d2qi01173e
IF: 7.779
2022-01-01
Inorganic Chemistry Frontiers
Abstract:Plasma-etched OV-Ti 2 O 3 behaves as an active and stable catalyst for electrochemical N 2 reduction to yield NH 3 , capable of attaining a large NH 3 yield of 37.24 μg h −1 mg cat. −1 and high faradaic efficiency of 19.29%.
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