Efficient Model-Based OPC via Graph Neural Network

Shuyuan Sun,Xuelian Chen,Fan Yang,Bei Yu,Shang Li,Xuan Zeng
DOI: https://doi.org/10.1109/ISEDA59274.2023.10218720
2023-01-01
Abstract:As feature size continues to shrink and light source wavelengths remain unchanged, the optical diffraction effects seriously degrade chip yield. Optical proximity correction (OPC) has become an essential step for chip manufacturability. However, OPC cannot achieve satisfactory mask correction results in an affordable number of iterations on some layouts, delaying the chip design cycle. In this paper, we propose to use the Graph Neural Network (GNN) to predict the initial mask correction and speed up model-based OPC. We design a graph model to represent the chip layout, with segments represented as graph nodes and the diffraction effects between them represented as graph edges. The GNN is used to obtain the embedding of the segment, and we predict the shift value based on its output. The proposed GNN-based predictor enhances the original OPC to find a good correction solution for full-chip-size masks in fewer iterations. compared with the original OPC method, experimental results on 55nm and 32nm full chip designs show that the proposed GNN-based OPC method reduces the number of iterations up to 75% and the acquired mask of comparable quality.
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