Patterning of SiO2 Interfaces for Radiative Cooling Applications

Zhenmin Ding,Jérémy Werlé,Xin Li,Hongbo Xu,Lei Pan,Yao Li,Lorenzo Pattelli
DOI: https://doi.org/10.1051/epjconf/202328704026
2023-01-01
EPJ Web of Conferences
Abstract:Silicon dioxide (SiO2) is a prominent material for radiative cooling applications due to its negligible absorption at solar wavelengths (0.25-2.5 µm) and exceptional stability. However, at thermal infrared wavelengths, its bulk phonon-polariton band introduces a strong reflection peak inside the atmospheric transparency window (8-13 µm) which is detrimental to its selective emissivity. Herein, we demonstrate scalable strategies for the patterning of ordered and disordered SiO2 metasurfaces enhancing their thermal emissivity and enabling sub-ambient passive cooling under direct sunlight.
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