A Backside-Illuminated 3.5 mu m Pixel With 86% Demodulation Contrast at 1.0 V Voltage Swing for Indirect Time-of-Flight Image Sensors

Congzhen Hu,Bing Zhang,Youze Xin,Chi Wang,Yiyun Xie,Pengfei Hu,Zungui Ke,Li Geng
DOI: https://doi.org/10.1109/TED.2023.3298311
IF: 3.1
2023-01-01
IEEE Transactions on Electron Devices
Abstract:This article presents a 3.5 mu m stacked backside-illuminated (BSI) indirect time-of-flight (i-ToF) pixel fabricated in a 65-nm CMOS image sensors (CIS) process. Transfer gate-induced lateral electric field control of charge transfer is one of the most relied techniques for implementing i-ToF image sensors. However, the transfer gate as modulated gate usually needs a high voltage swing to achieve high demodulation contrast (DC). We introduce a photonic demodulator pixel that utilizes a new lateral electric field modulation technology to achieve a 1.0 V modulation voltage swing while maintaining a high DC of 86% at 100 MHz modulation frequency. The proposed method employs a gate-controlled junction field effect transistor (JFET) to control the drain-induced barrier lowering (DIBL) effect to modulate the lateral electric field. In addition, the photonic demodulator can be also fully depleted with an N-type epitaxy for 22% quantum efficiency (QE) enhancement at 940 nm. This development can greatly lower the power consumption for high-resolution i-ToF sensor applications.
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