High-Performance Solar-Blind Ultraviolet Photodetectors Based on Β-Ga2o3 Thin Films Grown on P-Si(111) Substrates with Improved Material Quality Via an AlN Buffer Layer Introduced by Metal–Organic Chemical Vapor Deposition

Chong Gao,Yuefei Wang,Shihao Fu,Danyang Xia,Yurui Han,Jiangang Ma,Haiyang Xu,Bingsheng Li,Aidong Shen,Yichun Liu
DOI: https://doi.org/10.1021/acsami.3c07876
IF: 9.5
2023-01-01
ACS Applied Materials & Interfaces
Abstract:We have achieved significantly improved device performance in solar-blind deep-ultraviolet photodetectors fabricated from beta-Ga2O3 thin films grown via metal-organic chemical vapor deposition (MOCVD) on p-Si(111) substrates by improving material quality through the use of an AlN buffer layer. High-structural-quality beta-Ga2O3 films with a (-201) preferred orientation are obtained after the introduction of the AlN buffer. Under 3 V bias, the dark current reaches a minimum of 45 fA, and the photo-to-dark current ratio (PDCR) reaches 8.5 x 10(5) in the photodetector with the metalsemiconductor-metal (MSM) structure. The peak responsivity and detectivity are 38.8 A/W and 2.27 x 10(15) cm.Hz(1/2)/W, respectively, which are 16.5 and 230 times that without the buffer layer. Additionally, benefiting from the introduction of the AlN layer, the photodetection performance of the beta-Ga2O3/AlN/Si heterojunction is significantly improved. The PDCR, peak responsivity, and detectivity for the beta-Ga2O3/AlN/p-Si photodetector at 5 V bias are 2.7 x 10(3), 11.84 A/W, and 8.31 x 10(13) cm.Hz(1/2)/W, respectively. The improved structural quality of beta-Ga2O3 is mainly attributed to the decreased in-plane lattice mismatch of 2.3% for beta-Ga2O3(-201)/AlN(002) compared to that of 20.83% for beta-Ga2O3(-201)/Si(111), as well as the elimination of the native amorphous SiOx surface layer on the Si substrate during the initial growth of oxide thin films.
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