Square Patterns Formed from the Directed Self-Assembly of Block Copolymers

Weihua Li,Xueying Gu

DOI: https://doi.org/10.1039/d0me00168f

2021-01-01

Abstract:Incorporation the design of AB-type block copolymers into the strategy of directed self-assembly should provide a promising perspective for the formation of large-scale ordered square patterns..

What problem does this paper attempt to address?

Directed Self-Assembly of Hierarchical Supramolecular Block Copolymer Thin Films on Chemical Patterns

Guang-Peng Wu,Xiaoying Liu,Xuanxuan Chen,Hyo Seon Suh,Xiao Li,Jiaxing Ren,Christopher G. Arges,Faxue Li,Zhang Jiang,Paul F. Nealey

DOI: https://doi.org/10.1002/admi.201600048

IF: 5.4

2016-01-01

Advanced Materials Interfaces

Abstract:A long-range ordered lamellae-within-lamellae hierarchical structure is reported for the first time through the directed self-assembly of supramolecular polymer-surfactant thin films on chemical patterns with density multiplication. The coassembly of supramolecular system with gold nanoparticles is further achieved to create a hybrid material with well-organized nanoparticle arrays, expanding the palette of morphologies and structures available for nanoscale fabrication. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Boundary-Directed Epitaxy of Block Copolymers

Robert M. Jacobberger,Vikram Thapar,Guang-Peng Wu,Tzu-Hsuan Chang,Vivek Saraswat,Austin J. Way,Katherine R. Jinkins,Zhenqiang Ma,Paul F. Nealey,Su-Mi Hur,Shisheng Xiong,Michael S. Arnold

DOI: https://doi.org/10.1038/s41467-020-17938-3

IF: 16.6

2020-01-01

Nature Communications

Abstract:Directed self-assembly of block copolymers (BCPs) enables nanofabrication at sub-10 nm dimensions, beyond the resolution of conventional lithography. However, directing the position, orientation, and long-range lateral order of BCP domains to produce technologically-useful patterns is a challenge. Here, we present a promising approach to direct assembly using spatial boundaries between planar, low-resolution regions on a surface with different composition. Pairs of boundaries are formed at the edges of isolated stripes on a background substrate. Vertical lamellae nucleate at and are pinned by chemical contrast at each stripe/substrate boundary, align parallel to boundaries, selectively propagate from boundaries into stripe interiors (whereas horizontal lamellae form on the background), and register to wide stripes to multiply the feature density. Ordered BCP line arrays with half-pitch of 6.4 nm are demonstrated on stripes >80 nm wide. Boundary-directed epitaxy provides an attractive path towards assembling, creating, and lithographically defining materials on sub-10 nm scales. Directing the position, orientation, and long-range lateral order of block copolymer domains to produce technologically-useful, sublithographic patterns is a challenge. Here, the authors present a promising approach to overcome the challenge by directing assembly using spatial boundaries between planar, low-resolution regions on a surface with different composition.
Self-Assembly of Block Copolymers with Tailored Functionality: from the Perspective of Intermolecular Interactions

Rui-Yang Wang,Moon Jeong Park

DOI: https://doi.org/10.1146/annurev-matsci-081519-020046

IF: 9.7

2020-01-01

Annual Review of Materials Research

Abstract:Recent advances in the synthesis of block copolymers have enabled the creation of smart and functional designer polymers possessing specific intermolecular interactions. The long-range nature of these interactions strongly affects the molecular packings and microstructures of such polymers, which are intimately related to their properties. In addition to various applications, their unique physicochemical properties, distinguished from conventional block copolymers, are attracting significant attention from polymer and materials scientists. In this review, we describe the current understanding of the structure-property relationship of block copolymers having long-range interactions and suggest possible directions of technological development. We particularly focus on how specific interactions, such as Coulombic, π-π stacking, hydrogen-bonding, and metal/ion-dipole interactions, affect the molecular arrangements of block copolymers on the nanometer and molecular scales. Such information could lead to block copolymers with more advanced functions for future nanotechnologies.
Hierarchical Self-Assembly of Spider Silk-Like Block Copolymers

Sreevidhya Krishnaji,Wenwen Huang,Peggy Cebe,David E. Kaplan

2011-01-01

Abstract:Submitted for the MAR11 Meeting of The American Physical Society Hierarchical self-assembly of spider silk-like block copolymers SREEVIDHYA KRISHNAJI, WENWEN HUANG, PEGGY CEBE, DAVID KAPLAN, Tufts University — Block copolymers provide an attractive venue to study well-defined nano-structures that self-assemble to generate functionalized nanoand mesoporous materials. In the present study, a novel family of spider silk-like block copolymers was designed, bioengineered and characterized to study the impact of sequence chemistry, secondary structure and block length on assembled morphology. Genetic variants of native spider dragline silk (major ampullate spidroin I, Nephila clavipes) were used as polymer building blocks. Characterization by FTIR revealed increased ?-sheet content with increasing hydrophobic A blocks; SEM revealed spheres, rod-like structures, bowl-shaped and giant compound micelles. Langmuir Blodgett monolayers were prepared at the air-water interface at different surface pressures and monolayer films analyzed by AFM revealed oblate to prolate structures. Circular micelles, rod-like, densely packed circular structures were observed for HBA6 at increasing surface pressure. Exploiting hierarchical assembly provide a promising approach to rationale designs of protein block copolymer systems, allowing comparison to traditional synthetic systems. Wenwen Huang Tufts University Date submitted: 27 Nov 2010 Electronic form version 1.4
Surface-field-induced Microstructures of Asymmetric Diblock Copolymer Nanoparticles

Shiben Li,Meijiao Liu,Yongyun Ji,Linxi Zhang,Haojun Liang

DOI: https://doi.org/10.1038/pj.2011.35

IF: 3.135

2011-01-01

Polymer Journal

Abstract:The microstructures of asymmetric diblock copolymer nanoparticles were investigated using real-space self-consistent field theory. The nanoparticle boundary provides a spherical confinement in which the highly deformable copolymers are forced into a closed and crowded space. The surface-field-induced effects on the microstructures were examined systematically, and a rich variety of novel structures, such as mixtures of distorted cylinders and spherical lamellae, was observed in the copolymer nanoparticles. Investigations of the free energies indicate that the surface-field-induced structural transitions are of the first order. The formation mechanism of the confinement-induced structures was reasonably elucidated, based on the interactions between the polymer chains and confinement boundaries, and on the spherical symmetry from confinements. Our theoretical results are in good agreement with available simulation and experimental observations. The asymmetric diblock copolymer nanoparticles show a rich variety of novel structures, such as mixtures of distorted cylinders and spherical lamellae, due to the surface-field-induced effects from the nanoparticle surfaces.
Dissipative Particle Dynamics Simulation on the Self-Assembly of Linear Abc Triblock Copolymers under Rigid Spherical Confinements

Xiaoqiang Liu,Chun Zhou,Honggang Xia,Yang Zhou,Weidong Jiang

DOI: https://doi.org/10.1515/epoly-2016-0306

2017-01-01

e-Polymers

Abstract:AbstractAlthough a great deal of unique nanostructures were already obtained from polymer self-assemblies in terms of conventional parameters, the self-assembly under the confinement is still not well understood. Here, dissipative particle dynamics simulations were used to explore the self-assemble behaviors of linear ABC triblock copolymers under rigid spherical confinements. First several unusual morphologies, such as multilayer onion, coupled helix, and stacked lamella, were distinguished from the total 210 simulations. Second, the influences of three important parameters (block sequence, wall selectivity, and spherical radius) on the morphologies were discussed in detail. Finally, the dynamics evolution of several typical aggregates was examined. This simulation enriches micelle morphologies for the self-assembly of linear ABC triblock copolymers under rigid spherical confinements and is helpful to understand the formation of valuable nanostructures from linear ABC terpolymers.
Self-assembly of ABCBA Linear Pentablock Terpolymers

Lei Guo,Junting Xu,Binyang Du

DOI: https://doi.org/10.1080/15583724.2023.2178008

2024-01-01

Polymer Reviews

Abstract:The multiblock copolymers, which exhibit more complex block composition and sequences than those of di- or tri-block copolymers, have attracted more and more scientific interest and attention in the past years. The ABCBA linear pentablock terpolymer with block number of 5 is a representative model and starting point for investigating the self-assembly of multiblock copolymers, which is helpful for understanding the assembled structures and solution properties of biomacromolecules with complex sequence structures. Compared with AB diblock copolymers and ABC triblock terpolymers, the ABCBA pentablock terpolymers have more intricate morphologies and have better mechanical properties with similar morphologies. This review will mainly focus on ABCBA linear pentablock terpolymers and systematically summary the recent research progress in self-assembly of ABCBA linear pentablock terpolymers in bulk and solution as well as their potential applications in various technical fields including drug carriers, surface coatings, inorganic material templates, battery materials, and polymer gel.
Hybrid Patterns from Directed Self-Assembly of Diblock Copolymers by Chemical Patterns.

Wenfeng Zhao,Weihua Li

DOI: https://doi.org/10.1039/c9cp02667c

2019-01-01

Abstract:The surface affinity is a critical factor for controlling the formation of monolayer nanostructures in block copolymer thin films. In general, strong surface affinity tends to induce the formation of domains with low spontaneous curvature. Abiding by this principle, we propose a facile chemoepitaxial scheme for producing large-scale ordered hybrid patterns by the directed self-assembly of diblock copolymers. The guiding chemical pattern is designed as periodic stripes with alternately changing surface affinities. As a consequence, two different geometries of domains are formed on the stripes with different affinities. The self-assembly process of block copolymers guided by the stripe patterns is investigated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, and the kinetic stability diagram is estimated. Hybrid patterns are successfully achieved with both cylinder-forming and sphere-forming diblock copolymers. In the cylinder-forming system, the major hybrid pattern exhibiting a considerable stability window is composed of parallel cylinders and perforated lamellae, while it is composed of monolayer spheres and parallel cylinders in the other system. Encouragingly, the chemoepitaxial method is valid till the period of the guiding pattern is a large multiple of the domain spacing. The chemoepitaxial scheme demonstrated in this work serves as a nice supplement to the graphoepitaxial one proposed in our previous work.
Self-assembly of Diblock Copolymer Confined in an Array-Structure Space.

Xuehao He,Zhixiang Zou,Di Kan,Haojun Liang

DOI: https://doi.org/10.1063/1.4907532

2015-01-01

Abstract:The combination of top-down and bottom-up technologies is an effective method to create the novel nanostructures with long range order in the field of advanced materials manufacture. In this work, we employed a polymeric self-consistent field theory to investigate the pattern formation of diblock copolymer in a 2D confinement system designed by filling pillar arrays with various 2D shapes such as squares, rectangles, and triangles. Our simulation shows that in such confinement system, the microphase structure of diblock copolymer strongly depends on the pitch, shape, size, and rotation of the pillar as well as the surface field of confinement. The array structures can not only induce the formation of new phase patterns but also control the location and orientation of pattern structures. Finally, several methods to tune the commensuration and frustration of array-structure confinement are proposed and examined.
Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns

June Huh

DOI: https://doi.org/10.3390/polym16070881

IF: 5

2024-03-24

Polymers

Abstract:We conducted a computational study on the self-assembly behavior of cylinder-forming block copolymers, directed by a guide pattern of hexagonally or tetragonally arrayed pillars, using mesoscale density functional theory simulations. By adjusting the spacing (Lp) and diameter (D) of the pillars in relation to the intrinsic cylinder-to-cylinder distance (L2) of the cylinder-forming block copolymer, we investigated the efficiency of multiple-replicating cylinders, generated by the block copolymer, through the pillar-directed self-assembly process. The simulations demonstrated that at specific values of normalized parameters L ̃2=L2/Lp and D ̃=D/Lp coupled with suitable surface fields, triple and quadruple replications are achievable with a hexagonally arrayed pillar pattern, while only double replication is attainable with a tetragonally arrayed pillar pattern. This work, offering an extensive structure map encompassing a wide range of possible parameter spaces, including L ̃2 and D ̃, serves as a valuable guide for designing the contact hole patterning essential in nanoelectronics applications.

polymer science
Architectural Design of Block Copolymers

Zhanwen Xu,Qingshu Dong,Weihua Li

DOI: https://doi.org/10.1021/acs.macromol.3c01730

IF: 5.5

2024-01-01

Macromolecules

Abstract:Highly designable architectures of polymers endow the same polymer with different properties. In principle, diverse architectures should enrich the self-assembly behavior of block copolymers, providing a possibility for the formation of many novel ordered phases. However, it is infeasible to simply search the huge library of architectures for the formation of desired new phases, and it requires some valid guiding principles for efficiently designing block copolymers. In the past decade, some sophisticated mechanisms have been proposed in addition to the common mechanism that the self-assembly of block copolymers is dictated by the competition between the interaction energy and the stretching energy. To realize these sophisticated mechanisms in the architectures constitutes the guiding principles for the design of block copolymers. A series of theoretical works have demonstrated that one or more sophisticated mechanisms can be derived for desired novel phases, and thus the architectures of block copolymers can be properly designed to achieve these phases. To date, only the architectures of flexible copolymers are considered. In the future, the concept of designing architectures for the formation of the desired novel phases can be extended to a broader range of block copolymers, e.g., semiflexible and charged. In addition, it would be more useful to design block copolymers for the desired properties that are dictated by not only the chain architecture but also the phase-separated structure.
Anomalous Self-assembly of Architecturally Semiflexible Block Copolymers

Shifeng Nian,Zhouhao Fan,Guillaume Freychet,Mikhail Zhernenkov,Stefanie Redemann,Li-Heng Cai

DOI: https://doi.org/10.1021/acs.macromol.1c01911

2021-09-12

Abstract:Block copolymer self-assembly is a fundamental process in which incompatible blocks spontaneously form organized microstructures with broad practical applications. Classical understanding is that the domain spacing is limited by the contour length of the polymer backbone. Here, using a combination of molecular design, chemical synthesis, small/wide-angle X-ray scattering, transmission electron microscopy, and electron tomography, we discover that this molecular picture does not hold for architecturally semiflexible block copolymers. For strongly segregated linear-semiflexible bottlebrush-linear triblock copolymers, the size of the bottlebrush domain can be twice the bottlebrush backbone contour length. The mechanism of such anomalous self-assembly likely is that the interfacial repulsion between the incompatible blocks is large enough to pull a part of the linear end-blocks into the bottlebrush domain. This effectively increases the bottlebrush domain size. Moreover, the semiflexible bottlebrush widens the regime for cylinder morphology that is associated with the volume fraction of the end blocks $f_C^{SFB}\in(0.10,>0.40)$. This window is much wider than that for flexible linear block copolymers, $f_C^{F} \in(0.14,0.35)$, and that predicted by recent self-consistent field theory for linear-bottlebrush block copolymers of the same chemistry and molecular architecture. Our experimental findings reveal previously unrecognized mechanisms for the self-assembly of architecturally complex block copolymers.

Soft Condensed Matter,Chemical Physics
Well-controlled 2D Squares from Conjugated Block Copolymers

Pan Zhang,Guosong Chen

DOI: https://doi.org/10.1007/s11426-018-9257-3

2018-01-01

Science China Chemistry

Abstract:>Nanoscale two-dimensional (2D) polymer-based platelet structures are of considerable interest for a range of applications [1]. In principle, solution self-assembly of block copolymers (BCPs) provides a convenient route to analogous planar nanostructures derived from soft matter [2]. However,the formation of 2D platelet micelles is generally uncommon relative to other morphologies. In literature, this type of materials is always prepared by crystallization-driven selfassembly or some other crystalline-related methods, while non-crystallization approach is quite rare [3].
The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning.

Tzu-Hsuan Chang,Shisheng Xiong,Chi-Chun Liu,Dong Liu,Paul F Nealey,Zhenqiang Ma

DOI: https://doi.org/10.1002/marc.201700285

IF: 5.006

2017-01-01

Macromolecular Rapid Communications

Abstract:The direct self-assembly of cylinder-forming poly(styrene-block-methyl-meth-acrylate) (PS-b-PMMA) block copolymer is successfully assembled into two orientations, according to the underlying guiding pattern in different areas. Lying-down and perpendicular cylinders are formed, respectively, depending on the design of chemical pattern: sparse line/space pattern or hexagonal dot array. The first chemical pattern composed of prepatterned cross-linked polystyrene (XPS) line/space structure has a period (LS) equal to twice the intercylinder period of the block copolymer (L-0). The PS-b-PMMA thin film on the prepared chemical template after thermal annealing forms a lying-down cylinder morphology when the width of the PS strips is less than the width of PS block in the PS-b-PMMA block copolymer. The morphology is only applicable at the discrete thickness of the PS-b-PMMA film. In addition to forming the lying-down cylinders directly on the XPS guiding pattern, the cylinder-forming block copolymer can also be assembled in a perpendicular way on the second guiding pattern (the hexagonal dot array). The block copolymer films are registered into two orientations in a single directed self-assembly process. The features of the assembled patterns are successfully transferred down to the silicon oxide substrate.
Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Nathanael Wu,J. Buriak,C. Jin,E. Luber,B. Olsen

DOI: https://doi.org/10.1021/acs.langmuir.6b01365

IF: 3.9

2016-06-01

Langmuir

Abstract:Bottom-up self-assembly of high-density block-copolymer nanopatterns is of significant interest for a range of technologies, including memory storage and low-cost lithography for on-chip applications. The intrinsic or native spacing of a given block copolymer is dependent upon its size (N, degree of polymerization), composition, and the conditions of self-assembly. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymers, which are well-established for the production of strongly segregated single-layer hexagonal nanopatterns of silica dots, can be layered sequentially to produce density-doubled and -tripled nanopatterns. The center-to-center spacing and diameter of the resulting silica dots are critical with respect to the resulting double- and triple-layer assemblies because dot overlap reduces the quality of the resulting pattern. The addition of polystyrene (PS) homopolymer to PS-b-PDMS reduces the size of the resulting silica dots but leads to increased disorder at higher concentrations. The quality of these density-multiplied patterns can be calculated and predicted using parameters easily derived from SEM micrographs of corresponding single and multilayer patterns; simple geometric considerations underlie the degree of overlap of dots and layer-to-layer registration, two important factors for regular ordered patterns, and clearly defined dot borders. Because the higher-molecular-weight block copolymers tend to yield more regular patterns than smaller block copolymers, as defined by order and dot circularity, this sequential patterning approach may provide a route toward harnessing these materials, thus surpassing their native feature density.

Materials Science,Chemistry,Medicine
Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes.

Qingliang Song,Jing Zhou,Qingshu Dong,Shuoqiu Tian,Yifang Chen,Shengxiang Ji,Shisheng Xiong,Weihua Li

DOI: https://doi.org/10.1021/acs.langmuir.4c01912

IF: 3.9

2024-01-01

Langmuir

Abstract:The guiding pattern in the chemoepitaxially directed self-assembly (DSA) of block copolymers is often fabricated by periodically functionalizing homogeneously random copolymer brushes tethered on a substrate. The prepatterned copolymer brushes constitute a soft penetrable surface, and their two components can in principle locally segregate in response to the overlying self-assembly process of block copolymers. To reveal how the self-responsive behavior of the copolymer brushes affects the directing effect, we develop a dissipative particle dynamics model to explicitly include the prepatterned polymer brushes and implement it to simulate the DSA of a cylinder-forming diblock copolymer melt on the sparse pattern of polymer brushes. Through large-scale dynamic simulations, we identify the windows of the content of the random copolymer, the film thickness, and the diameter of the patterned spot, for the formation of perfectly ordered hexagonal patterns composed of perpendicular cylinders. Our dynamic simulations reveal that the random copolymer brushes grafted on the unpatterned area exhibit a remarkable self-responsive ability with respect to the self-assembly of the diblock copolymers overlying them, which may widen the effective window of the content of the random copolymer. Within the processing windows of these key parameters, defect-free patterns are successfully achieved both in simulations and in experiments with sizes as large as a few micrometers for 4-fold density multiplications. This work demonstrates that highly efficient computer simulations based on an effective model can provide helpful guidance for experiments to optimize the critical parameters and even may promote the application of DSA.
Ordering Dynamics of Directed Self-Assembly of Block Copolymers in Periodic Two-Dimensional Fields

Weihua Li,Feng Qiu,Yuliang Yang,An-Chang Shi

DOI: https://doi.org/10.1021/ma9023203

IF: 5.5

2010-01-01

Macromolecules

Abstract:The ordering dynamics of directed self-assembly of cylinder-forming diblock copolymers is studied by cell dynamics simulations. The directing field, mimicking chemically or topologically patterned substrates, is in the form of hexagonally arranged potential wells attractive to minority blocks. Time evolution of the defect concentration is used to characterize the ordering dynamics of the self-assembled cylindrical structures of the block copolymers. When the period of the external potential, Ls, is a small integer multiple of the cylinder-to-cylinder distance, L0, of the block copolymer microphase, the defect concentration decays exponentially. The defect annihilation becomes slower as Ls is increased, and eventually, the exponential decay law is broken. When the ratio Ls/L0 is a square root of an integer, large polycrystalline grains with different orientations are observed. The results are consistent with available experimental and theoretical results.
Perfectly Ordered Patterns Formed by a Heterogeneous Nucleation Process of Block Copolymer Self-Assembly Under Rectangular Confinement

Tao Yang,Siwen Tian,Yu Zhu,Weihua Li

DOI: https://doi.org/10.1021/acs.langmuir.6b03638

IF: 3.9

2016-01-01

Langmuir

Abstract:The heterogeneous nucleation process during the phase separation of binary blends of the AB diblock and the C homopolymer induced by rectangular confinement is studied by cell dynamics simulation based on the time dependent Ginzburg Landau theory. The main goal is to yield large-scale ordered hexagonal patterns by tailoring the surface potentials of the sidewalls. Our study reveals a crucial condition to induce the desired heterogeneous nucleation process in which the nucleated domain grains grow and merge into a defect-free pattern. Specifically, nucleations are induced simultaneously by two parallel sidewalls with a strong surface potential, whereas the spontaneous nucleation and the heterogeneous nucleation at the other two walls with a weak surface potential are suppressed. Moreover, the confinement effect of the other two walls can ensure that the two rows of nucleated domains have correlated positions. Importantly, we find that the ordering process under the crucial condition exhibits a high tolerance to the rectangular sizes. Only a few defects in thousands of domains are occasionally caused that are observed to be annihilated in a short-annealing time via various mechanisms. This study may provide a facile route to prepare large-scale ordered patterns-via a simple rectangular confinement.
Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Peng Chen,Haojun Liang,Ru Xia,Jiasheng Qian,Xiaoshuang Feng

DOI: https://doi.org/10.1021/ma301203a

IF: 5.5

2013-01-01

Macromolecules

Abstract:Using real-space self-consistent field theory calculations (SCFT), directed self-assembly of block copolymers was explored on sparsely nanopatterned substrates. In this study, the lamellar structure forming block copolymers are confined between two surfaces. The top surface is strictly neutral, and the bottom one is periodically patterned with neutral interspacing (nanopattern), which forms a sparsely nanopatterned substrate. The dimension of nanopatterns is commensurate with periods of lamellar structure of the block copolymers self-assembling in bulk. By systematically varying the film thickness and interspacing between nanopatterns, the density multiplication of nanopattern in the film was investigated, and a variety of nanostructures not available in bulk (nonbulk structures) were observed.
Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns

Tzu-Hsuan Chang,Shisheng Xiong,Robert M. Jacobberger,Solomon Mikael,Hyo Seon Suh,Chi-Chun Liu,Dalong Geng,Xudong Wang,Michael S. Arnold,Zhenqiang Ma,Paul F. Nealey

DOI: https://doi.org/10.1038/srep31407

IF: 4.6

2016-01-01

Scientific Reports

Abstract:Directed self-assembly of block copolymers is a scalable method to fabricate well-ordered patterns over the wafer scale with feature sizes below the resolution of conventional lithography. Typically, lithographically-defined prepatterns with varying chemical contrast are used to rationally guide the assembly of block copolymers. The directed self-assembly to obtain accurate registration and alignment is largely influenced by the assembly kinetics. Furthermore, a considerably broad processing window is favored for industrial manufacturing. Using an atomically-thin layer of graphene on germanium, after two simple processing steps, we create a novel chemical pattern to direct the assembly of polystyrene-block-poly(methyl methacrylate). Faster assembly kinetics are observed on graphene/germanium chemical patterns than on conventional chemical patterns based on polymer mats and brushes. This new chemical pattern allows for assembly on a wide range of guiding periods and along designed 90° bending structures. We also achieve density multiplication by a factor of 10, greatly enhancing the pattern resolution. The rapid assembly kinetics, minimal topography and broad processing window demonstrate the advantages of inorganic chemical patterns composed of hard surfaces.

Square Patterns Formed from the Directed Self-Assembly of Block Copolymers

Directed Self-Assembly of Hierarchical Supramolecular Block Copolymer Thin Films on Chemical Patterns

Boundary-Directed Epitaxy of Block Copolymers

Self-Assembly of Block Copolymers with Tailored Functionality: from the Perspective of Intermolecular Interactions

Hierarchical Self-Assembly of Spider Silk-Like Block Copolymers

Surface-field-induced Microstructures of Asymmetric Diblock Copolymer Nanoparticles

Dissipative Particle Dynamics Simulation on the Self-Assembly of Linear Abc Triblock Copolymers under Rigid Spherical Confinements

Self-assembly of ABCBA Linear Pentablock Terpolymers

Hybrid Patterns from Directed Self-Assembly of Diblock Copolymers by Chemical Patterns.

Self-assembly of Diblock Copolymer Confined in an Array-Structure Space.

Directed Self-Assembly of Cylinder-Forming Block Copolymers Using Pillar Topographic Patterns

Architectural Design of Block Copolymers

Anomalous Self-assembly of Architecturally Semiflexible Block Copolymers

Well-controlled 2D Squares from Conjugated Block Copolymers

The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning.

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes.

Ordering Dynamics of Directed Self-Assembly of Block Copolymers in Periodic Two-Dimensional Fields

Perfectly Ordered Patterns Formed by a Heterogeneous Nucleation Process of Block Copolymer Self-Assembly Under Rectangular Confinement

Directed self-assembly of block copolymers on sparsely nanopatterned substrates

Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns