Rapid Sintering and Nondestructive Testing of Nano-Metal Chip Bonding Layer by Pulsed Current Discharge

Xiandong Li,Ding Xiong,Weiyang Zheng,Liang Yu,Jian Li
DOI: https://doi.org/10.1109/tcpmt.2023.3336296
2023-01-01
IEEE Transactions on Components Packaging and Manufacturing Technology
Abstract:Developing new high-performance packaging technologies adapting for the third-generation semiconductors is an urgent need to the related industry applications nowadays. In this work, we reported a novel method for the rapid sintering and nondestructive testing of the nanometal chip bonding layer by pulsed current discharge, which can realize short sintering time (millisecond level), low sintering temperature (< 200 degree celsius), and high bonding strength (>50 MPa). The physical mechanism behind the transient sintering process was revealed based on high-speed observation, infrared measurement, and electrical parameter analysis. The statistical and SEM analysis indicated that the sample resistance and the bonding strength have a negative correlation, which means that the electric characteristics can be used as an important evaluation index for the bonding state. Finally, a practical prediction model for the time-varying resistance of the well-sintered sample (reference curve) was established. On this basis, the nondestructive testing method of the bonding layer and its optimal sintering strategy were proposed. Overall, this work provides a deeper insight into the electrical sintering, proving its promising application prospect.
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