Gate dielectric layer mitigated device degradation of AlGaN/GaN-based devices under proton irradiation

Lilai Jiang,Chengzhen Song,Yu-Ning Wu,Shiyou Chen
DOI: https://doi.org/10.1063/5.0150381
IF: 1.697
2023-01-01
AIP Advances
Abstract:In this study, the simulations of AlGaN/GaN-based devices, including AlGaN/GaN high electron mobility transistor (HEMT), Al2O3 metal-oxide-semiconductor high electron mobility transistor (MOSHEMT), and SiNx metal-insulator-semiconductor high electron mobility transistor (MISHEMT), were studied to investigate the degradation mechanism after proton irradiation. The vacancies produced by proton irradiation, especially Ga vacancy (V-Ga), are found to be responsible for the device degradation by carrier removal and mobility degradation, which directly influence the saturation drain current and maximum transconductance of AlGaN/GaN-based devices. Furthermore, AlGaN/GaN HEMTs with gate dielectrics (Al2O3, SiNx) exhibit better irradiation resistance than traditional AlGaN/GaN HEMTs, which produce fewer vacancies at the channel after proton irradiation. Al2O3 MOSHEMTs also show better performance than SiNx MISHEMTs in resisting proton damage. Therefore, a high-quality dielectric layer is a key factor to improve the reliability of AlGaN/GaN-based devices after proton irradiation.
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