First-principles study on effects of X (Ta, Ti, and W) on the nitriding behavior of ??-Ni3Al in Ni-based superalloys: From the surface adsorption and diffusion of nitrogen

Luyao Hao,Yang Bai,Yongxin Liu,Xiaowei Lei,Wenjing Yao,Nan Wang
DOI: https://doi.org/10.1016/j.apsusc.2023.157249
IF: 6.7
2023-01-01
Applied Surface Science
Abstract:The role of X (Ta, Ti, and W) doping in affecting the adsorption and diffusion behavior of nitrogen at Ni3Al(1 1 0) and Ni3Al(1 1 1) surfaces was studied based on first-principles calculations to understand the nitriding mecha-nism of gamma '-Ni3Al in Ni-based superalloys. The calculated results show that the substituting of X atom on the 1st-layer (top layer) Al site could enhance the adsorption ability of N on Ni3Al surface, especially on Ni3Al(1 1 1), owing to the stronger bonding strength between N and X atoms. For comparison, the effect of the X atom on the adsorption behavior of nitrogen is not significant when it is doped in the 2nd-layer or 3rd-layer. Nitrogen diffusion into the Ni3Al surfaces as the rate-determining step of nitriding is calculated based on the climbing image nudged elastic band (CI-NEB) method. The doping of Ti could significantly decrease the energy barriers of N penetration into gamma '-Ni3Al surface, regardless of surface orientation, which contributes to promoting the nitriding process of gamma ' phase. The strongest strengthening effect of Ti explains the experimental results that gamma '-Ni3Al contains Ti element having a great nitriding behavior in Ni-based superalloys. Our results can provide an in-depth insight into the diffusion mechanism of nitriding gamma '-Ni3Al phase in Ni-based superalloys.
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