Abstract:Because of the deterioration of global water quality, the occurrence of chemical and microbial contaminants in water raises serious concerns for the health of the population. Identifying and developing effective and environmentally friendly water treatment technologies are critical to obtain clean water. Among the various technologies for the purification of water, ultraviolet photolysis of chlorine (UV/chlorine), an emerging advanced oxidation process (AOP), has multiple functions for the control of contaminants via the production of hydroxyl radicals (HO·) and reactive chlorine species (RCS), such as Cl·, ClO·, and Cl2·-.This Account centers around the radical chemistry of RCS and HO· in different water matrices and their roles and mechanisms in the abatement of contaminants. The concentrations of Cl·, ClO·, and Cl2·- are comparable to or higher than those of HO· (10-14 to 10-13 M). The reactivities of RCS are more selective than HO· with a broader range of second-order rate constants (k). The k values of Cl· toward most aromatics are higher or similar as compared to those of HO·, while those of Cl2·- and ClO· are less reactive but more selective toward aromatics containing electron-donating functional groups. Their major reaction mechanisms with Cl· are electron transfer and addition, while those with ClO· and Cl2·- primarily involve electron transfer. As for aliphatics, their reactivities with both HO· and RCS are much lower than those of aromatics. The reaction mechanisms for most of them with Cl· and Cl2·- are hydrogen abstraction, except for olefins, which are addition. In addition, RCS greatly contribute to the inactivation of microbial contaminants.Toward future application, the UV/chlorine process has both pros and cons. Compared with the traditional HO·-based AOP of UV/H2O2, UV/chlorine is more efficient and energy-saving for oxidation and disinfection, and its efficiency is less affected by water matrix components. However, the formation of toxic byproducts in UV/chlorine limits its application scenarios. In dissolved organic matter (DOM)-rich water, the formation of halogenated byproducts is enhanced in UV/chlorine. In the presence of ammonia, reactive nitrogen species (RNS) (e.g., ·NO and ·NO2) are involved, and highly toxic nitro(so) products such as nitro(so)-phenolics and N-nitrosodimethylamine are generated. For a niche application, the UV/chlorine process is recommended to be utilized in water with low levels of DOM and ammonia.Strategies should be developed to make full use of highly reactive species (RCS and HO·) for the abatement of target contaminants and to reduce the formation of toxic byproducts. For example, the UV/chlorine process can be used in tandem with other treatments to create multiple barriers for the production of safe water. In addition, halogen radicals are very important in ecosystems as well as other areas such as medical therapy and organic synthesis. UV/chlorine is the most efficient homogeneous system to generate halogen radicals, and thus it provides a perfect system to investigate the fates of halogen radicals for interdisciplinary research.

A Novel Source of Radicals from UV/Dichloroisocyanurate for Surpassing Abatement of Emerging Contaminants Versus Conventional UV/Chlor(am)ine Processes.

Assessing excimer far-UVC (222 nm) irradiation for advanced oxidation processes: Oxidants photochemistry and micropollutants degradation

UV/Chlorine Process: An Efficient Advanced Oxidation Process with Multiple Radicals and Functions in Water Treatment

A Novel UVA/ClO2 Advanced Oxidation Process for the Degradation of Micropollutants in Water.

Ultraviolet (Uv)-Based Advanced Oxidation Processes for Micropollutant Abatement in Water Treatment: Gains and Problems

Multi-angle Comparison of UV/chlorine, UV/monochloramine, and UV/chlorine Dioxide Processes for Water Treatment and Reuse.

Photolysis of Chlorine Dioxide under UVA Irradiation: Radical Formation, Application in Treating Micropollutants, Formation of Disinfection Byproducts, and Toxicity under Scenarios Relevant to Potable Reuse and Drinking Water

Mechanism, kinetics and DBP formation of UV/NH2Cl process on contaminant removal in aqueous solution: A review

Enhanced degradation of emerging contaminants by Far-UVC photolysis of peracetic acid: Synergistic effect and mechanisms

Ultraviolet activation of monochloramine to treat contaminants of emerging concern: reactions, operating parameters, byproducts, and opportunities

The Efficient Abatement of Contaminants of Emerging Concern by LED-UV275nm/electrochemical Chlorine for Wastewater Reuse: Kinetics, Degradation Pathways, and Cytotoxicity

UV 222 nm Emission from KrCl* Excimer Lamps Greatly Improves Advanced Oxidation Performance in Water Treatment

State of the Art of UV/Chlorine Advanced Oxidation Processes: Their Mechanism, Byproducts Formation, Process Variation, and Applications

Chlorine oxide radical: An emerging free radical for denitrification and pollutant degradation

On the increasing competitiveness of UV/Cl to UV/H2O2 advanced oxidation as the organic carbon concentration increases

The efficient abatement of contaminants of emerging concern by LED-UV 275nm /electrochemical chlorine for wastewater reuse: kinetics, degradation pathways, and cytotoxicity

Simultaneous Removal of Chlorite and Contaminants of Emerging Concern under UV Photolysis: Hydroxyl Radicals Vs. Chlorate Formation.

UV/chlorine advanced oxidation processes for degradation of contaminants in water and wastewater: A comprehensive review

Unravelling Molecular Transformation of Dissolved Effluent Organic Matter in UV/H2O2, UV/persulfate, and UV/chlorine Processes Based on FT-ICR-MS Analysis

Antibiotics degradation by UV/chlor(am)ine advanced oxidation processes: A comprehensive review

Mechanistic and Kinetic Understanding of Micropollutant Degradation by the UV/NH2Cl Process in Simulated Drinking Water