Syntheses of Η1‐alkyl‐η3‐allyl‐η5‐cyclopentadienyl Cobalt(III) Complexes and Their Use in Low‐temperature Atomic Layer Deposition of Cobalt‐Containing Thin Films

Ke Lu,Jiahao Zhu,Jialiang Wang,Qingbo Wa,Zheng Guo,Wei Xiong,Yuan Gao,Renbo Lei,Bichu Cheng,Xinwei Wang
DOI: https://doi.org/10.1002/chem.202203656
2023-01-01
Chemistry - A European Journal
Abstract:Herein, we report the design and scalable synthesis of three new Co(III) complexes, which have an unusual hydrocarbon η1 -alkyl-η3 -allyl-η5 -cyclopentadienyl ligation structure, from the reactions of readily available cobalt(II) compound CoCl2 (PPh3 )2 and biomass material β-pinene via C-C bond activation. These Co(III) complexes are air-stable, fairly volatile, and thermally stable, so they are excellent candidates as the metal precursors for the vapor deposition of cobalt-containing thin films. As a demonstration, we show that the Co(III) complex of [(3'-5'-η,1-σ)-methylene(2,2,4-trimethyl-4-cyclohexene-1,3-diyl)](η5 -methylcyclopentadienyl)Co (i. e. (seco-pinene)(MeCp)Co) is well suited for the atomic layer deposition (ALD) of Co3 O4 and CoS2 thin films, and the deposited Co3 O4 and CoS2 films are able to conformally cover trench structures with a fairly high aspect ratio of 10 : 1.
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